Defect structure and phase transitions in epitaxial metastable cubic Ti0.5Al0.5N alloys grown on MgO(001) by ultra‐high‐vacuum magnetron sputter deposition

1991 ◽  
Vol 69 (9) ◽  
pp. 6437-6450 ◽  
Author(s):  
F. Adibi ◽  
I. Petrov ◽  
L. Hultman ◽  
U. Wahlström ◽  
T. Shimizu ◽  
...  
Keyword(s):  
Phase Transitions ◽  
Defect Structure ◽  
High Vacuum ◽  
Sputter Deposition ◽  
Ultra High Vacuum ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Enhanced quality of epitaxial AlN thin films on 6H–SiC by ultra-high-vacuum ion-assisted reactive dc magnetron sputter deposition

2000 ◽  
Vol 76 (2) ◽  
pp. 170-172 ◽  
Author(s):  
S. Tungasmita ◽  
J. Birch ◽  
P. O. Å. Persson ◽  
K. Järrendahl ◽  
L. Hultman
Keyword(s):  
Thin Films ◽  
High Vacuum ◽  
Sputter Deposition ◽  
Ultra High Vacuum ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Ultra-high vacuum dc magnetron sputter-deposition of 0001-textured trigonal α-Ta2C/Al2O3(0001) thin films

Materialia ◽  
2020 ◽  
Vol 13 ◽  
pp. 100838 ◽  
Author(s):  
Koichi Tanaka ◽  
Angel Aleman ◽  
Hicham Zaid ◽  
Michael E. Liao ◽  
Koki Hojo ◽  
...  
Keyword(s):  
Thin Films ◽  
High Vacuum ◽  
Sputter Deposition ◽  
Ultra High Vacuum ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Energetic particle fluxes in magnetron sputter deposition of a-Si:H

1991 ◽  
Vol 137-138 ◽  
pp. 783-786 ◽  
Author(s):  
Alan M. Myers ◽  
James R. Doyle ◽  
G. Jeff Feng ◽  
Nagi Maley ◽  
David L. Ruzic ◽  
...  
Keyword(s):  
Energetic Particle ◽  
Sputter Deposition ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Particle Fluxes

Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition

2013 ◽  
Vol 662 ◽  
pp. 413-416
Author(s):  
Yi Shen ◽  
Ruo He Yao
Keyword(s):  
Grain Size ◽  
Film Thickness ◽  
Substrate Temperature ◽  
Sheet Resistance ◽  
Cross Section ◽  
Sputter Deposition ◽  
Surface Profiling ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Substrate Temperatures

Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.

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