Polycrystalline silicon carbide films deposited by low‐power radio‐frequency plasma decomposition of SiF4‐CF4‐H2gas mixtures

1991 ◽  
Vol 69 (7) ◽  
pp. 3915-3923 ◽  
Author(s):  
Gautam Ganguly ◽  
Subal C. De ◽  
Swati Ray ◽  
A. K. Barua
Keyword(s):  
Silicon Carbide ◽  
Low Power ◽  
Radio Frequency ◽  
Polycrystalline Silicon ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Polycrystalline Silicon Carbide ◽  
Plasma Decomposition

Characteristics of graphene grown through low power capacitive coupled radio frequency plasma enhanced chemical vapor deposition

Carbon ◽  
2020 ◽  
Vol 159 ◽  
pp. 570-578 ◽  
Author(s):  
Yu-Chen Chang ◽  
Chun-Chieh Yen ◽  
Hung-Chieh Tsai ◽  
Tsung Cheng Chen ◽  
Chia-Ming Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Power ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

Floating low-temperature radio-frequency plasma oxidation of polycrystalline silicon-germanium

1998 ◽  
Vol 73 (3) ◽  
pp. 360-362 ◽  
Author(s):  
Zhineng Fan ◽  
Gang Zhao ◽  
Paul K. Chu ◽  
Zhonghe Jin ◽  
Hoi S. Kwok ◽  
...  
Keyword(s):  
Low Temperature ◽  
Radio Frequency ◽  
Silicon Germanium ◽  
Polycrystalline Silicon ◽  
Radio Frequency Plasma ◽  
Plasma Oxidation ◽  
Frequency Plasma

scholarly journals Modification of a Fur Semi-finished Sheepskins by Radio Frequency Plasma in an Inert Gas Medium

2021 ◽  
Vol 1923 (1) ◽  
pp. 012020
Author(s):  
E A Pankova ◽  
F S Sharifullin ◽  
G R Rakhmatullina ◽  
R R Shagivalieva ◽  
V S Zheltukhin
Keyword(s):  
Radio Frequency ◽  
Inert Gas ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Gas Medium
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