Study of the structure in rf glow discharges in SiH4/H2by spatiotemporal optical emission spectroscopy: Influence of negative ions

1990 ◽  
Vol 68 (11) ◽  
pp. 5532-5539 ◽  
Author(s):  
Fumiyoshi Tochikubo ◽  
Akira Suzuki ◽  
Shigeru Kakuta ◽  
Yuko Terazono ◽  
Toshiaki Makabe
1998 ◽  
Vol 317 (1-2) ◽  
pp. 120-123 ◽  
Author(s):  
J.L Andújar ◽  
E Pascual ◽  
G Viera ◽  
E Bertran

1998 ◽  
Vol 544 ◽  
Author(s):  
M. Creatore ◽  
G. Cicala ◽  
P. Favia ◽  
R. Lamendola ◽  
R. d'Agostno

AbstractPlasma treatments in power modulated NH3 RF glow discharges have been performed for modifying the surface of polyethylene (PE). Time Resolved Optical Emission Spectroscopy (TR-OES) has been utilized for monitoring the emission of active species during the modulation period of the discharge, Electron Spectroscopy for Chemical Analysis (ESCA) has been used for studying the surface composition of PE before and after the derivatization of plasmagrafted -NH2 groups. We present our preliminary results here, which show how modulated NH3 plasmas can effectively improve the grafting selectivity of -NH2 respect to all other N-containing groups.


RSC Advances ◽  
2015 ◽  
Vol 5 (23) ◽  
pp. 18029-18034 ◽  
Author(s):  
Guanghong Wang ◽  
Chengying Shi ◽  
Ruidan Hu ◽  
Lei Zhao ◽  
Ge Wang ◽  
...  

An optical emission spectroscopic study identifies transient and steady-state behavior of the excited H*α/H*β/SiH*/GeH* emission in parallel plate SiH4/GeH4/H2 plasma.


1992 ◽  
Vol 71 (5) ◽  
pp. 2143-2150 ◽  
Author(s):  
Fumiyoshi Tochikubo ◽  
Toshiaki Makabe ◽  
Shigeru Kakuta ◽  
Akira Suzuki

2001 ◽  
Vol 398-399 ◽  
pp. 507-512 ◽  
Author(s):  
J.C Avelar-Batista ◽  
A.D Wilson ◽  
A Davison ◽  
A Leyland ◽  
A Matthews ◽  
...  

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