In situ optical emission spectroscopy diagnostics of glow discharges in SiH4/GeH4/H2

RSC Advances ◽  
2015 ◽  
Vol 5 (23) ◽  
pp. 18029-18034 ◽  
Author(s):  
Guanghong Wang ◽  
Chengying Shi ◽  
Ruidan Hu ◽  
Lei Zhao ◽  
Ge Wang ◽  
...  
Keyword(s):  
Steady State ◽  
Emission Spectroscopy ◽  
Parallel Plate ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
State Behavior ◽  
Glow Discharges ◽  
Steady State Behavior ◽  
Transient And Steady State

An optical emission spectroscopic study identifies transient and steady-state behavior of the excited H*α/H*β/SiH*/GeH* emission in parallel plate SiH4/GeH4/H2 plasma.

scholarly journals Machine Learning Prediction of Electron Density and Temperature from Optical Emission Spectroscopy in Nitrogen Plasma

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song
Keyword(s):  
Machine Learning ◽  
Electron Temperature ◽  
Real Time ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Plasma Nitridation

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

Transient and steady-state behavior of collective atomic systems driven by a classical field

1978 ◽  
Vol 18 (4) ◽  
pp. 1571-1576 ◽  
Author(s):  
L. M. Narducci ◽  
D. H. Feng ◽  
R. Gilmore ◽  
G. S. Agarwal
Keyword(s):  
Steady State ◽  
Classical Field ◽  
State Behavior ◽  
Atomic Systems ◽  
Steady State Behavior ◽  
Transient And Steady State

Correlation Between In Situ Optical Emission Spectroscopy in a Reactive O2 / AR RF Magnetron Sputtering Discharge and PZT Thin Film Composition

1997 ◽  
Vol 493 ◽  
Author(s):  
F. Ayguavives ◽  
P. Aubert ◽  
B. Ea-Kim ◽  
B. Agius
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Nuclear Reaction Analysis ◽  
Nominal Composition ◽  
Film Composition

ABSTRACTLead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).

Optical emission spectroscopy of rf glow discharges of methane–silane mixtures

1998 ◽  
Vol 317 (1-2) ◽  
pp. 120-123 ◽  
Author(s):  
J.L Andújar ◽  
E Pascual ◽  
G Viera ◽  
E Bertran
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Glow Discharges
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