High performance atomic-layer-deposited LaLuO3/Ge-on-insulator p-channel metal-oxide-semiconductor field-effect transistor with thermally grown GeO2 as interfacial passivation layer

2010 ◽  
Vol 97 (1) ◽  
pp. 012106 ◽  
Author(s):  
J. J. Gu ◽  
Y. Q. Liu ◽  
M. Xu ◽  
G. K. Celler ◽  
R. G. Gordon ◽  
...  
2008 ◽  
Vol 47 (4) ◽  
pp. 2538-2543 ◽  
Author(s):  
Daisuke Kosemura ◽  
Yasuto Kakemura ◽  
Tetsuya Yoshida ◽  
Atsushi Ogura ◽  
Masayuki Kohno ◽  
...  

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