Effects of radio‐frequency bias on GaAs surfaces etched by Ar‐electron‐cyclotron‐resonance plasma

1990 ◽  
Vol 67 (5) ◽  
pp. 2591-2595 ◽  
Author(s):  
S. K. Noh ◽  
K. Ishibashi ◽  
Y. Aoyagi ◽  
S. Namba ◽  
Y. Yoshizako
Keyword(s):  
Radio Frequency ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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