The plasma oxidation of titanium thin films to form dielectric layers

1989 ◽  
Vol 66 (6) ◽  
pp. 2320-2324 ◽  
Author(s):  
G. P. Burns ◽  
I. S. Baldwin ◽  
M. P. Hastings ◽  
J. G. Wilkes
Keyword(s):  
Thin Films ◽  
Plasma Oxidation ◽  
Dielectric Layers ◽  
Titanium Thin Films

Single-phase TiO2 formation by plasma oxidation of titanium thin films

2015 ◽  
Vol 47 (8) ◽  
pp. 828-831
Author(s):  
Deepti A. Rukade ◽  
Varsha Bhattacharyya
Keyword(s):  
Thin Films ◽  
Single Phase ◽  
Plasma Oxidation ◽  
Titanium Thin Films

A study of titanium thin films in transmission laser micro-joining of titanium-coated glass to polyimide

2010 ◽  
Vol 518 (10) ◽  
pp. 2632-2636 ◽  
Author(s):  
Taslema Sultana ◽  
Golam Newaz ◽  
Grigor L. Georgiev ◽  
Ronald J. Baird ◽  
Gregory W. Auner ◽  
...  
Keyword(s):  
Thin Films ◽  
Coated Glass ◽  
Titanium Thin Films

Interface reactions between titanium thin films and (1¯1 2) sapphire substrates

1991 ◽  
Vol 26 (23) ◽  
pp. 6300-6308 ◽  
Author(s):  
J. H. Selverian ◽  
F. S. Ohuchi ◽  
M. Bortz ◽  
M. R. Notis
Keyword(s):  
Thin Films ◽  
Interface Reactions ◽  
Sapphire Substrates ◽  
Titanium Thin Films

PLASMA OXIDATION OF HIGH Tc SUPERCONDUCTING THIN FILMS

1989 ◽  
pp. 257-262
Author(s):  
H.-U. HABERMEIER ◽  
W. EBERT ◽  
S. KALT ◽  
G. WAGNER ◽  
G. MERTENS
Keyword(s):  
Thin Films ◽  
Superconducting Thin Films ◽  
Plasma Oxidation ◽  
High Tc

In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma

2021 ◽  
Vol 542 ◽  
pp. 148684
Author(s):  
Jordi Fraxedas ◽  
Max Schütte ◽  
Guillaume Sauthier ◽  
Massimo Tallarida ◽  
Salvador Ferrer ◽  
...  
Keyword(s):  
Thin Films ◽  
Electronic Structure ◽  
Low Pressure ◽  
Rf Plasma ◽  
Xps Analysis ◽  
Inductively Coupled ◽  
In Situ Xps ◽  
Titanium Thin Films

Laser Induced Nanofabrication on Titanium Thin Films

1995 ◽  
Vol 397 ◽  
Author(s):  
B.D. Huey ◽  
D.A. Bonnell ◽  
A.D. Akhsakhalian ◽  
A.A. Gorbunov ◽  
A. Sewing ◽  
...  
Keyword(s):  
Thin Films ◽  
Scanning Probe Microscopy ◽  
Optical Resolution ◽  
Diffraction Limit ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Ion Laser ◽  
Titanium Thin Films ◽  
Novel Structures ◽  
Argon Ion

ABSTRACTIllumination of titanium thin films with an argon-ion laser has been used to fabricate nanometer scale features by localized oxidation. The laser induces a temperature gradient in the metal film, within which oxidation may occur. Due to the non-linearity of the reaction with temperature, the reaction zone can be laterally confined to regions narrower than the diffraction limit of optical resolution. Scanning probe microscopy indicates widths ranging from 105 to 600 nm and heights of 0.8 to 30 nm. The possibility of forming novel structures is demonstrated.

Thickness-dependent fcc–hcp phase transformation in polycrystalline titanium thin films

2011 ◽  
Vol 59 (7) ◽  
pp. 2615-2623 ◽  
Author(s):  
J. Chakraborty ◽  
Kishor Kumar ◽  
Rajeev Ranjan ◽  
S. Ghosh Chowdhury ◽  
S.R. Singh
Keyword(s):  
Thin Films ◽  
Phase Transformation ◽  
Titanium Thin Films
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