UV‐laser photolysis of trimethylaluminum for Al film growth

1985 ◽  
Vol 58 (11) ◽  
pp. 4397-4401 ◽  
Author(s):  
T. Motooka ◽  
S. Gorbatkin ◽  
D. Lubben ◽  
J. E. Greene
Keyword(s):  
Film Growth ◽  
Laser Photolysis ◽  
Uv Laser

SiO2 film growth by ArF laser photolysis of SiH4/N2O mixtures

1991 ◽  
Vol 51 (3-4) ◽  
pp. 171-176 ◽  
Author(s):  
Masaharu Tsuji ◽  
Minoru Sakumoto ◽  
Naoki Itoh ◽  
Hiroshi Obase ◽  
Yukio Nishimura
Keyword(s):  
Film Growth ◽  
Sio2 Film ◽  
Laser Photolysis ◽  
Arf Laser

UV laser photolysis and quantum yields of para-substituted phenyldiazosulphonate surfactants

1994 ◽  
Vol 83 (2) ◽  
pp. 129-140 ◽  
Author(s):  
B. Metzner ◽  
K. Meindl ◽  
J.-C. Panitz ◽  
O. Nuyken ◽  
T. Mezger ◽  
...  
Keyword(s):  
Laser Photolysis ◽  
Quantum Yields ◽  
Uv Laser

THE UV PHOTOLYSIS AND THE MULTIPHOTON IONIZATION OF HYDRIDES OF GROUP VA ELEMENTS I. UV LASER PHOTOLYSIS OF NH3

1987 ◽  
Vol 3 (03) ◽  
pp. 229-236
Author(s):  
Ni Tuqiang ◽  
◽  
Yu Shuqin ◽  
Ma Xingxiao ◽  
Kong Fanao
Keyword(s):  
Multiphoton Ionization ◽  
Laser Photolysis ◽  
Uv Laser ◽  
Uv Photolysis

Electronic three wave mixing spectra of transient species produced by UV laser photolysis of benzene

1979 ◽  
Vol 70 (10) ◽  
pp. 4673-4680 ◽  
Author(s):  
Kenneth P. Gross ◽  
Dennis M. Guthals ◽  
Joseph W. Nibler
Keyword(s):  
Laser Photolysis ◽  
Wave Mixing ◽  
Uv Laser ◽  
Transient Species

High-power UV laser photolysis of nucleosides: final product analysis

1991 ◽  
Author(s):  
Dimitar A. Angelov ◽  
M. Berger ◽  
J. Cadet ◽  
Jean-Pierre Ballini ◽  
E. Keskinova ◽  
...  
Keyword(s):  
High Power ◽  
Laser Photolysis ◽  
Uv Laser ◽  
Product Analysis

Mechanism of Chromium Deposition from Cr(CO)6 by Uv Laser Light

1989 ◽  
Vol 158 ◽  
Author(s):  
R. Nowak ◽  
P. Hess
Keyword(s):  
Gas Phase ◽  
Metal Film ◽  
Film Growth ◽  
Laser Light ◽  
Film Deposition ◽  
Uv Laser ◽  
Impurity Incorporation ◽  
Metal Atoms ◽  
Chromium Films ◽  
Main Growth

ABSTRACTThe mechanism of metal film deposition from carbonyls as precursors is discussed in detail. It is shown that different species produced by UV laser irradiation in the gas phase contribute to film growth. Highly reactive species such as metal atoms may be important during the nucleation phase, whereas more stable carbonyls are responsible for the main growth process. This indicates that the main decarbonylation effect occurs at the surface. The higher level of impurity incorporation in chromium films in comparison with nickel films is explained by the relative position of the Fermi level in the d-band of Ni and Cr with respect to the 2π* level of CO, which favors CO bond dissociation in the case of chromium.

UV Laser Photolysis of Disiloxanes for Chemical Vapor Deposition of Nano-Textured Silicones

2002 ◽  
Vol 14 (1) ◽  
pp. 144-153 ◽  
Author(s):  
Josef Pola ◽  
Anna Galíková ◽  
Aftanas Galík ◽  
Vratislav Blechta ◽  
Zdeněk Bastl ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Photolysis ◽  
Uv Laser
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