Electrical and optical properties of amorphous hydrogenated silicon prepared by reactive ion beam sputtering

1984 ◽  
Vol 56 (4) ◽  
pp. 1097-1103 ◽  
Author(s):  
Jagriti Singh ◽  
R. C. Budhani ◽  
K. L. Chopra
2014 ◽  
Vol 48 (9) ◽  
pp. 1242-1247 ◽  
Author(s):  
A. P. Dostanko ◽  
O. A. Ageev ◽  
D. A. Golosov ◽  
S. M. Zavadski ◽  
E. G. Zamburg ◽  
...  

1986 ◽  
Vol 77 ◽  
Author(s):  
D. Girginoudi ◽  
A. Thanailakis ◽  
A. Christou

ABSTRACTAmorphous hydrogenated silicon-tin films (α — Six Snx:H) have been prepared by co-electron beam and Knudsen cell deposition. It is shown that the dependence of Eg on x, over the entire range of 0 < x < 0.51 studied, cannot be described by a single linear relationship. The d.c. conductivity measurements indicate two distinct conduction regions as a function of x. The addition of Sn up to x = 0.10 creates a high density of dangling bonds and moves the band edges so a significant conductivity increase is observed. The bonding between Si and H is preferred to Sn and H. Sn-H bonds were observed only for x > 0.40. Photoluminescence measurements show that band edge luminescence dominates at 1.3–1.4 eV.


2012 ◽  
Author(s):  
Yiqin Ji ◽  
Huasong Liu ◽  
Yugang Jiang ◽  
Dandan Liu ◽  
Lishuan Wang ◽  
...  

2010 ◽  
Vol 57 (5B) ◽  
pp. 1197-1199 ◽  
Author(s):  
Yen-Hsun Su ◽  
Sheng-Lung Tu ◽  
Ho-Tung Lin ◽  
Chun-Chieh Huang

1985 ◽  
Vol 58 (2) ◽  
pp. 954-957 ◽  
Author(s):  
R. W. Collins ◽  
H. Windischmann ◽  
J. M. Cavese ◽  
J. Gonzalez‐Hernandez

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