Optical properties of dense thin‐film Si and Ge prepared by ion‐beam sputtering

1985 ◽  
Vol 58 (2) ◽  
pp. 954-957 ◽  
Author(s):  
R. W. Collins ◽  
H. Windischmann ◽  
J. M. Cavese ◽  
J. Gonzalez‐Hernandez
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Effect of Thickness Affecting Optical Properties of Ge Thin Film Preparing by Ultra Vacuum Ion Beam Sputtering

2010 ◽  
Vol 57 (5B) ◽  
pp. 1197-1199 ◽  
Author(s):  
Yen-Hsun Su ◽  
Sheng-Lung Tu ◽  
Ho-Tung Lin ◽  
Chun-Chieh Huang
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering

2018 ◽  
Vol 47 (3) ◽  
pp. 321004
Author(s):  
王利栓 Wang Lishuan ◽  
杨霄 Yang Xiao ◽  
刘丹丹 Liu Dandan ◽  
姜承慧 Jiang Chenghui ◽  
刘华松 Liu Huasong ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Ion Beam ◽  
Tantalum Oxide ◽  
Annealing Effect ◽  
Oxide Thin Film ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

2019 ◽  
Vol 682 ◽  
pp. 109-120 ◽  
Author(s):  
Wjatscheslaw Sakiew ◽  
Stefan Schrameyer ◽  
Marco Jupé ◽  
Philippe Schwerdtner ◽  
Nick Erhart ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Sputtering ◽  
Thin Film Thickness ◽  
Optical Thin Film ◽  
Beam Sputtering ◽  
Beam Parameters

Characteristics of optical band gap of tantalum oxide thin film deposited by ion beam sputtering

2017 ◽  
Vol 25 (1) ◽  
pp. 21-27
Author(s):  
刘华松 LIU Hua-song ◽  
杨 霄 YANG Xiao ◽  
王利栓 WANG Li-shuan ◽  
姜玉刚 JIANG Yu-gang ◽  
季一勤 JI Yi-qin ◽  
...  
Keyword(s):  
Thin Film ◽  
Band Gap ◽  
Optical Band Gap ◽  
Ion Beam ◽  
Tantalum Oxide ◽  
Oxide Thin Film ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Ln-Ba-Cu-O Thin Film Deposited by Ion Beam Sputtering

1989 ◽  
pp. 527-531
Author(s):  
Tsutomu Yotsuya ◽  
Yoshihiko Suzuki ◽  
Soichi Ogawa ◽  
Hajime Kuwahara ◽  
Tetsuro Tajima ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

The effect of charged particles when preparing ZnO thin film by ion beam sputtering deposition

1988 ◽  
Vol 33-34 ◽  
pp. 1114-1119 ◽  
Author(s):  
Yoshihiko Suzuki ◽  
Tsutom Yotsuya ◽  
Katsumi Takiguchi ◽  
Masaaki Yoshitake ◽  
Soichi Ogawa
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Charged Particles ◽  
Zno Thin Film ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering

Controlled thin-film deposition of α or β Ga2O3 by ion-beam sputtering

2020 ◽  
Vol 38 (6) ◽  
pp. 063412
Author(s):  
Martin Becker ◽  
Sebastian L. Benz ◽  
Limei Chen ◽  
Angelika Polity ◽  
Peter J. Klar ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ion Beam Sputtering ◽  
Beam Sputtering
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