Surface passivation of n-type Czochralski silicon substrates by thermal-SiO2/plasma-enhanced chemical vapor deposition SiN stacks
1995 ◽
Vol 24
(6)
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pp. 761-766
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2007 ◽
Vol 61
(21)
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pp. 4301-4304
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2001 ◽
Vol 19
(3)
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pp. 759
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Keyword(s):
2008 ◽
Vol 8
(19)
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pp. 3523-3527
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