Interface recombination velocity and misfit strain in molecular‐beam epitaxy double heterostructures of GaAs/GaxIn1−xP(0.47

1981 ◽  
Vol 52 (10) ◽  
pp. 6312-6315 ◽  
Author(s):  
G. B. Scott ◽  
G. Duggan ◽  
J. S. Roberts
1996 ◽  
Vol 421 ◽  
Author(s):  
M. Passlack ◽  
M. Hong

AbstractWe have extended the spectrum of molecular-beam epitaxy (MBE) related techniques by introducing in-situ deposition of oxides. The oxide films have been deposited on clean, atomically ordered (100) GaAs wafer surfaces using molecular beams of gallium-, magnesium-, silicon-, or aluminum oxide. Among the fabricated oxide-GaAs heterostructures, Ga2O3-GaAs interfaces exhibit unique electronic properties including an interface state density Dit in the low 1010 cm−2eV−1 range and an interface recombination velocity S of 4000 cm/s. The formation of inversion layers in both n- and p-type GaAs has been clearly established. Further, thermodynamic and photochemical stability of excellent electronic interface properties of Ga2O3-GaAs structures has been demonstrated.


1983 ◽  
Vol 43 (6) ◽  
pp. 569-571 ◽  
Author(s):  
C. W. Tu ◽  
S. R. Forrest ◽  
W. D. Johnston

2015 ◽  
Vol 107 (5) ◽  
pp. 051601 ◽  
Author(s):  
Enrico Jarzembowski ◽  
Frank Syrowatka ◽  
Kai Kaufmann ◽  
Wolfgang Fränzel ◽  
Torsten Hölscher ◽  
...  

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