scholarly journals Erratum: Computer simulation of SEM electron beam induced current images of dislocations and stacking faults [J. Appl. Phys. 51, 1624 (1980)]

1980 ◽  
Vol 51 (10) ◽  
pp. 5573 ◽  
Author(s):  
C. Donolato ◽  
H. Klann
Keyword(s):  
Computer Simulation ◽  
Electron Beam ◽  
Stacking Faults ◽  
Induced Current ◽  
Electron Beam Induced Current

EBIC Study of Electrical Activity of Stacking Faults in Multicrystalline Sheet Silicon

2005 ◽  
Vol 108-109 ◽  
pp. 627-630
Author(s):  
Jinggang Lu ◽  
George A. Rozgonyi ◽  
James Rand ◽  
Ralf Jonczyk
Keyword(s):  
Electron Beam ◽  
Electrical Activity ◽  
High Spatial Resolution ◽  
Stacking Faults ◽  
Interstitial Oxygen ◽  
Induced Current ◽  
Contrast Variation ◽  
Lifetime Measurements ◽  
Recombination Lifetime ◽  
Electron Beam Induced Current

The electrical activity of stacking faults (SFs) in multicrystalline sheet silicon has been examined by correlating EBIC(electron beam induced current), preferential defect etching, and microwave photo-conductance decay (PCD) lifetime measurements. Following a three hour 1060 0C annealing the interstitial oxygen concentration decreased from 14 to 4.5 x 1017 cm-3, during which time a high density of SFs were generated in the center of individual large grains. Subsequent EBIC contrast variation within individual large grains was correlated with the local SF density revealed by preferential etching. In addition, a more quantitative intra-grain lifetime was obtained from high spatial resolution PCD measurements. It was found that an SF density of 1 to 2 x 106 cm-2 produces a lifetime limitation in sheet silicon which corresponds to a recombination lifetime of ~2 µs.

Electron-beam-induced current study of stacking faults and partial dislocations in 4H-SiC Schottky diode

2008 ◽  
Vol 93 (3) ◽  
pp. 033514 ◽  
Author(s):  
Bin Chen ◽  
Jun Chen ◽  
Takashi Sekiguchi ◽  
Takasumi Ohyanagi ◽  
Hirofumi Matsuhata ◽  
...  
Keyword(s):  
Electron Beam ◽  
Schottky Diode ◽  
Stacking Faults ◽  
Induced Current ◽  
Partial Dislocations ◽  
Electron Beam Induced Current

Ebic Study of Fe Precipitation on Bulk Stacking Fault in Czochralski-Grown Silicon

1997 ◽  
Vol 469 ◽  
Author(s):  
B. Shen ◽  
T. Sekiguchi ◽  
P. Chen ◽  
K. Yang ◽  
Z. Z. Chen ◽  
...  
Keyword(s):  
Electron Beam ◽  
Stacking Faults ◽  
Stacking Fault ◽  
Induced Current ◽  
Partial Dislocations ◽  
Electron Beam Induced Current ◽  
Oxygen Precipitates ◽  
Fe Impurities

ABSTRACTFe precipitation on bulk stacking faults in Czochralski-grown silicon are investigated by means of the electron-beam-induced-current (EBIC) technique and other techniques. It is found that Fe impurities only precipitate on Frank partial dislocations bounding stacking faults when the specimen is cooled slowly; however, they precipitate on both Frank partials and fault planes when the specimen is cooled fast. It is explained that small oxygen precipitates on fault planes, together with Frank partials, serve as the gettering centers for Fe impurities in the fast cooled specimen.

Recombination Behaviour of Stacking Faults in SiC p-i-n Diodes

2006 ◽  
Vol 527-529 ◽  
pp. 367-370 ◽  
Author(s):  
S.I. Maximenko ◽  
P. Pirouz ◽  
Tangali S. Sudarshan
Keyword(s):  
Electron Beam ◽  
Electrical Activity ◽  
Quantum Wells ◽  
Radiative Recombination ◽  
Stacking Faults ◽  
Nonradiative Recombination ◽  
Induced Current ◽  
Pin Diodes ◽  
Partial Dislocations ◽  
Electron Beam Induced Current

In this paper the electrical activity of stacking faults and that of their bounding partial dislocations in degraded PiN diodes has been investigated by the technique of electron beam induced current (EBIC). The recombination behavior of C- and Si-core dislocations is discussed. It is proposed that nonradiative recombination significantly exceeds radiative recombination on both the C- and Si-core partial dislocations. At the same time, predominantly radiative recombination takes place in the faulted planes that presumably act as quantum wells.

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