Effect of decamethylcyclopentasiloxane and trifluoromethane electron cyclotron resonance plasmas on F–SiCOH low dielectric constant film deposition

Chao Ye; Haiyan Zhang; Zhaoyuan Ning

doi:10.1063/1.3159880

Effect of decamethylcyclopentasiloxane and trifluoromethane electron cyclotron resonance plasmas on F–SiCOH low dielectric constant film deposition

Journal of Applied Physics ◽

10.1063/1.3159880 ◽

2009 ◽

Vol 106 (1) ◽

pp. 013302 ◽

Cited By ~ 2

Author(s):

Chao Ye ◽

Haiyan Zhang ◽

Zhaoyuan Ning

Keyword(s):

Dielectric Constant ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Low Dielectric Constant ◽

Low Dielectric

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The effect of pressure control on a thermally stable a-C:N thin film with low dielectric constant by electron cyclotron resonance-plasma

Thin Solid Films ◽

10.1016/s0040-6090(02)00146-3 ◽

2002 ◽

Vol 409 (2) ◽

pp. 178-184 ◽

Cited By ~ 8

Author(s):

X.W. Liu ◽

J.H. Lin ◽

W.J. Jong ◽

H.C. Shih

Keyword(s):

Thin Film ◽

Dielectric Constant ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pressure Control ◽

Electron Cyclotron ◽

Low Dielectric Constant ◽

Effect Of Pressure ◽

Low Dielectric ◽

Resonance Plasma

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Electron cyclotron resonance plasma source for conductive film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579309 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1281-1286 ◽

Cited By ~ 31

Author(s):

Toshiro Ono ◽

Hiroshi Nishimura ◽

Masaru Shimada ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Conductive Film ◽

Resonance Plasma

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Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l802 ◽

1993 ◽

Vol 32 (Part 2, No. 6A) ◽

pp. L802-L805 ◽

Cited By ~ 3

Author(s):

Akira Ishii ◽

Yoshiyuki Sakaguchi ◽

Shoichiro Minomo ◽

Michio Taniguchi ◽

Masato Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Diamond Like Carbon Film ◽

Resonance Plasma

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Super‐wide electron cyclotron resonance plasma source excited by traveling microwave as an efficient tool for diamondlike carbon film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579302 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1241-1243

Author(s):

A. Ishii ◽

S. Amadatsu ◽

S. Minomo ◽

M. Taniguchi ◽

M. Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Efficient Tool ◽

Electron Cyclotron Resonance Plasma ◽

Diamondlike Carbon ◽

Resonance Plasma

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On‐Chip Decoupling Capacitance with High Dielectric Constant and Strength Using SrTiO3 Thin Films Electron‐Cyclotron‐Resonance‐Sputtered at 400°C

Journal of The Electrochemical Society ◽

10.1149/1.1838185 ◽

1997 ◽

Vol 144 (12) ◽

pp. 4321-4325 ◽

Cited By ~ 2

Author(s):

Manabu Itsumi ◽

Shin‐ichi Ohfuji ◽

Mitsuo Tsukada ◽

Hideo Akiya

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

High Dielectric Constant ◽

Electron Cyclotron ◽

On Chip ◽

High Dielectric

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Characterization of electron cyclotron resonance process plasma and film deposition

Materials Science and Engineering A ◽

10.1016/0921-5093(91)90632-w ◽

1991 ◽

Vol 139 ◽

pp. 294-301 ◽

Cited By ~ 8

Author(s):

Shoji Miyake ◽

Wei Chen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Process

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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1997.604953 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

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Mass Spectrometry Investigation on Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma for SiCOH Film Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/25/2/076 ◽

2008 ◽

Vol 25 (2) ◽

pp. 636-639 ◽

Cited By ~ 6

Author(s):

Zhang Hai-Yan ◽

Ye Chao ◽

Ning Zhao-Yuan

Keyword(s):

Mass Spectrometry ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Relationships between the material properties of silicon oxide films deposited by electron cyclotron resonance chemical vapor deposition and their use as an indicator of the dielectric constant

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587141 ◽

1994 ◽

Vol 12 (1) ◽

pp. 441 ◽

Cited By ~ 30

Author(s):

B. Fowler

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Material Properties ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Chemical Vapor ◽

Electron Cyclotron

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Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579484 ◽

1995 ◽

Vol 13 (5) ◽

pp. 2427-2434 ◽

Cited By ~ 9

Author(s):

Morito Matsuoka ◽

Shun‐ichi Tohno

Keyword(s):

Oxide Film ◽

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Radio Frequency Sputtering ◽

Resonance Plasma

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