In situ study of surface reactions of atomic layer deposited LaxAl2−xO3 films on atomically clean In0.2Ga0.8As

2008 ◽  
Vol 93 (17) ◽  
pp. 172907 ◽  
Author(s):  
F. S. Aguirre-Tostado ◽  
M. Milojevic ◽  
B. Lee ◽  
J. Kim ◽  
R. M. Wallace
Keyword(s):  
Surface Reactions ◽  
Atomic Layer ◽  
In Situ Study

In situ study of the atomic layer deposition of HfO2 on Si

2012 ◽  
Vol 30 (1) ◽  
pp. 01A143 ◽  
Author(s):  
Krzysztof Kolanek ◽  
Massimo Tallarida ◽  
Marcel Michling ◽  
Dieter Schmeisser
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

scholarly journals In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS

2016 ◽  
Vol 6 (18) ◽  
pp. 6778-6783 ◽  
Author(s):  
Bao-Hua Mao ◽  
Ethan Crumlin ◽  
Eric C. Tyo ◽  
Michael J. Pellin ◽  
Stefan Vajda ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Ultrathin Films ◽  
Ambient Pressure ◽  
Atomic Layer ◽  
Oxygen Adsorption ◽  
Band Bending ◽  
In Situ Study ◽  
Ambient Pressure Xps ◽  
Effect Of Oxygen

APXPS was used to investigate the effect of oxygen adsorption on the band bending and electron affinity of ALD Al2O3, ZnO and TiO2 ultrathin films.

scholarly journals In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Pt Nanoparticles ◽  
Atomic Layer ◽  
Pt Nanoparticle ◽  
In Situ Study ◽  
Layer Deposition ◽  
Nanoparticle Stabilization ◽  
Thermal Stability Of

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.

Modeling and in Situ Probing of Surface Reactions in Atomic Layer Deposition

2017 ◽  
Vol 9 (18) ◽  
pp. 15848-15856 ◽  
Author(s):  
Yuanxia Zheng ◽  
Sungwook Hong ◽  
George Psofogiannakis ◽  
G. Bruce Rayner ◽  
Suman Datta ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Reactions ◽  
Atomic Layer ◽  
Layer Deposition

In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

1997 ◽  
Vol 112 ◽  
pp. 236-242 ◽  
Author(s):  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Aleks Aidla ◽  
Hele Siimon ◽  
Mikko Ritala ◽  
...  
Keyword(s):  
Thin Films ◽  
Tantalum Oxide ◽  
Atomic Layer ◽  
Atomic Layer Epitaxy ◽  
Oxide Thin Films ◽  
In Situ Study

scholarly journals Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study

2019 ◽  
Vol 483 ◽  
pp. 10-18 ◽  
Author(s):  
Alberto Perrotta ◽  
Julian Pilz ◽  
Antonella Milella ◽  
Anna Maria Coclite
Keyword(s):  
Thermal Treatment ◽  
Chemical Control ◽  
Atomic Layer ◽  
In Situ Study

In situ study of a strontium β-diketonate precursor for thin-film growth by atomic layer epitaxy

1994 ◽  
Vol 4 (8) ◽  
pp. 1239-1244 ◽  
Author(s):  
Jaan Aarik ◽  
Aleks Aidla ◽  
Andres Jaek ◽  
Markku Leskelä ◽  
Lauri Niinistö
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Atomic Layer Epitaxy ◽  
In Situ Study
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