In situ study of the atomic layer deposition of HfO2 on Si

2012 ◽  
Vol 30 (1) ◽  
pp. 01A143 ◽  
Author(s):  
Krzysztof Kolanek ◽  
Massimo Tallarida ◽  
Marcel Michling ◽  
Dieter Schmeisser
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

scholarly journals In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Pt Nanoparticles ◽  
Atomic Layer ◽  
Pt Nanoparticle ◽  
In Situ Study ◽  
Layer Deposition ◽  
Nanoparticle Stabilization ◽  
Thermal Stability Of

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.

scholarly journals In situ study of the role of substrate temperature during atomic layer deposition of HfO2 on InP

2013 ◽  
Vol 114 (15) ◽  
pp. 154105 ◽  
Author(s):  
H. Dong ◽  
Santosh, K.C. ◽  
X. Qin ◽  
B. Brennan ◽  
S. McDonnell ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Substrate Temperature ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

In situ study of HfO2 atomic layer deposition on InP(100)

2013 ◽  
Vol 102 (17) ◽  
pp. 171602 ◽  
Author(s):  
H. Dong ◽  
B. Brennan ◽  
D. Zhernokletov ◽  
J. Kim ◽  
C. L. Hinkle ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

scholarly journals Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

Coatings ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 369 ◽  
Author(s):  
Richard Krumpolec ◽  
Tomáš Homola ◽  
David Cameron ◽  
Josef Humlíček ◽  
Ondřej Caha ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Vapour Deposition ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atomic Layer ◽  
Nanocrystalline Films ◽  
Zinc Blende ◽  
Layer Deposition

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 °C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.

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