In situ study of a strontium β-diketonate precursor for thin-film growth by atomic layer epitaxy

1994 ◽  
Vol 4 (8) ◽  
pp. 1239-1244 ◽  
Author(s):  
Jaan Aarik ◽  
Aleks Aidla ◽  
Andres Jaek ◽  
Markku Leskelä ◽  
Lauri Niinistö
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Atomic Layer Epitaxy ◽  
In Situ Study

In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition

2011 ◽  
Vol 11 (2) ◽  
pp. 1577-1580 ◽  
Author(s):  
Yong Jun Park ◽  
Dong Ryeol Lee ◽  
Hyun Hwi Lee ◽  
Han-Bo-Ram Lee ◽  
Hyungjun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
X Ray ◽  
X Ray Scattering ◽  
Layer Deposition ◽  
Scattering Study

In-situ study of Ni–Ti thin film growth on a TiN intermediate layer by X-ray diffraction

2007 ◽  
Vol 126 (1) ◽  
pp. 332-337 ◽  
Author(s):  
R MARTINS ◽  
N SCHELL ◽  
R SILVA ◽  
L PEREIRA ◽  
K MAHESH ◽  
...  
Keyword(s):  
Thin Film ◽  
Intermediate Layer ◽  
Film Growth ◽  
Thin Film Growth ◽  
X Ray Diffraction ◽  
X Ray ◽  
In Situ Study

Effect of potential on bismuth telluride thin film growth by electrochemical atomic layer epitaxy

2005 ◽  
Vol 50 (20) ◽  
pp. 4041-4047 ◽  
Author(s):  
W. Zhu ◽  
J.Y. Yang ◽  
X.H. Gao ◽  
S.Q. Bao ◽  
X.A. Fan ◽  
...  
Keyword(s):  
Thin Film ◽  
Bismuth Telluride ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Atomic Layer Epitaxy ◽  
Electrochemical Atomic Layer Epitaxy

Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)2 (M=Ni, Cu, Pt) precursors

2000 ◽  
Vol 157 (3) ◽  
pp. 151-158 ◽  
Author(s):  
Mikko Utriainen ◽  
Minna Kröger-Laukkanen ◽  
Leena-Sisko Johansson ◽  
Lauri Niinistö
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Atomic Layer Epitaxy ◽  
Metallic Thin Film

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

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