Comment on “Influence of exciting frequency on gas and ion rotational temperatures of nitrogen capacitively coupled plasma” [Phys. Plasmas 15, 073501 (2008)]

Volker Linss

doi:10.1063/1.2991356

Comment on “Influence of exciting frequency on gas and ion rotational temperatures of nitrogen capacitively coupled plasma” [Phys. Plasmas 15, 073501 (2008)]

Physics of Plasmas ◽

10.1063/1.2991356 ◽

2008 ◽

Vol 15 (10) ◽

pp. 104701

Author(s):

Volker Linss

Keyword(s):

Plasma Phys ◽

Capacitively Coupled ◽

Exciting Frequency ◽

Capacitively Coupled Plasma

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Response to “Comment on ‘Influence of exciting frequency on gas and ion rotational temperatures of nitrogen capacitively coupled plasma’” [Phys. Plasmas 15, 104701 (2008)]

Physics of Plasmas ◽

10.1063/1.2991357 ◽

2008 ◽

Vol 15 (10) ◽

pp. 104702

Author(s):

Yu Xin ◽

Xiao-Jiang Huang ◽

Zhao-Yuan Ning

Keyword(s):

Plasma Phys ◽

Capacitively Coupled ◽

Exciting Frequency ◽

Capacitively Coupled Plasma

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Comment on “A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma” [Phys. Plasmas 22, 123504 (2015)]

Physics of Plasmas ◽

10.1063/5.0037685 ◽

2021 ◽

Vol 28 (6) ◽

pp. 064701

Author(s):

Z. F. Ding

Keyword(s):

Plasma Phys ◽

Discharge Characteristic ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Response to “Comment on ‘A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma’” [Phys. Plasmas 28, 064701 (2021)]

Physics of Plasmas ◽

10.1063/5.0048524 ◽

2021 ◽

Vol 28 (6) ◽

pp. 064702 ◽

Cited By ~ 1

Author(s):

Young-Cheol Kim ◽

Hyun-Jun Kim ◽

Hyo-Chang Lee ◽

Chin-Wook Chung

Keyword(s):

Plasma Phys ◽

Discharge Characteristic ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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The influence of Exciting Frequency on N 2 and N 2 + Vibrational Temperature of Nitrogen Capacitively Coupled Plasma

Chinese Physics Letters ◽

10.1088/0256-307x/26/5/055202 ◽

2009 ◽

Vol 26 (5) ◽

pp. 055202 ◽

Cited By ~ 3

Author(s):

Huang Xiao-Jiang ◽

Xin Yu ◽

Zhang Jie ◽

Ning Zhao-Yuan

Keyword(s):

Vibrational Temperature ◽

Capacitively Coupled ◽

Exciting Frequency ◽

Capacitively Coupled Plasma

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Influence of exciting frequency on gas and ion rotational temperatures of nitrogen capacitively coupled plasma

Physics of Plasmas ◽

10.1063/1.2952838 ◽

2008 ◽

Vol 15 (7) ◽

pp. 073501 ◽

Cited By ~ 22

Author(s):

X. J. Huang ◽

Y. Xin ◽

Q. H. Yuan ◽

Z. Y. Ning

Keyword(s):

Capacitively Coupled ◽

Exciting Frequency ◽

Capacitively Coupled Plasma

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Dust transport phenomena in a capacitively coupled plasma reactor

Journal of Applied Physics ◽

10.1063/1.1285843 ◽

2001 ◽

Vol 89 (1) ◽

pp. 34-41 ◽

Cited By ~ 4

Author(s):

Heon Chang Kim ◽

Vasilios I. Manousiouthakis

Keyword(s):

Plasma Reactor ◽

Transport Phenomena ◽

Capacitively Coupled ◽

Dust Transport ◽

Capacitively Coupled Plasma

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Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

Applied Physics Letters ◽

10.1063/1.127020 ◽

2000 ◽

Vol 77 (4) ◽

pp. 489-491 ◽

Cited By ~ 187

Author(s):

T. Kitajima ◽

Y. Takeo ◽

Z. Lj. Petrović ◽

T. Makabe

Keyword(s):

Capacitively Coupled ◽

Capacitively Coupled Plasma

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1-D Fluid Modeling of Methane Dissociation in Radiofrequency Capacitively Coupled Plasma

Renewable Energy for Smart and Sustainable Cities - Lecture Notes in Networks and Systems ◽

10.1007/978-3-030-04789-4_55 ◽

2018 ◽

pp. 516-522

Author(s):

Abdelatif Gadoum ◽

Djilali Benyoucef ◽

Mohamed Habib Allah Lahoual

Keyword(s):

Capacitively Coupled ◽

Fluid Modeling ◽

Capacitively Coupled Plasma ◽

Methane Dissociation

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Simulation of cold plasma in a chamber under high- and low-frequency voltage conditions for a capacitively coupled plasma

Journal of Semiconductors ◽

10.1088/1674-4926/33/10/104004 ◽

2012 ◽

Vol 33 (10) ◽

pp. 104004 ◽

Cited By ~ 1

Author(s):

Daoxin Hao ◽

Jia Cheng ◽

Linhong Ji ◽

Yuchun Sun

Keyword(s):

Cold Plasma ◽

Low Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Prediction of a Radial Variation of Plasma Structure and Ion Distributions in the Wafer Interface in Two-Frequency Capacitively Coupled Plasma

IEEE Transactions on Plasma Science ◽

10.1109/tps.2004.823968 ◽

2004 ◽

Vol 32 (1) ◽

pp. 90-100 ◽

Cited By ~ 28

Author(s):

T. Yagisawa ◽

K. Maeshige ◽

T. Shimada ◽

T. Makabe

Keyword(s):

Radial Variation ◽

Plasma Structure ◽

Capacitively Coupled ◽

Ion Distributions ◽

Capacitively Coupled Plasma

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