Ti-based nonalloyed Ohmic contacts for Al0.15Ga0.85N∕GaN high electron mobility transistors using regrown n+-GaN by plasma assisted molecular beam epitaxy

2008 ◽  
Vol 93 (10) ◽  
pp. 102102 ◽  
Author(s):  
Hui-Chan Seo ◽  
Patrick Chapman ◽  
Hyun-Ick Cho ◽  
Jung-Hee Lee ◽  
Kyekyoon (Kevin) Kim
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