Ti-based nonalloyed Ohmic contacts for Al0.15Ga0.85N∕GaN high electron mobility transistors using regrown n+-GaN by plasma assisted molecular beam epitaxy
2011 ◽
Vol 208
(7)
◽
pp. 1617-1619
◽
2002 ◽
Vol 49
(3)
◽
pp. 354-360
◽
2000 ◽
Vol 47
(5)
◽
pp. 1115-1117
◽
2011 ◽
Vol 29
(3)
◽
pp. 03C107
◽
2006 ◽
Vol E89-C
(7)
◽
pp. 906-912
◽
2005 ◽