Fabrication of strained and double heterojunction In/sub x/Ga/sub 1-x/P/In/sub 0.2/Ga/sub 0.8/As high electron mobility transistors grown by solid-source molecular beam epitaxy

2000 ◽  
Vol 47 (5) ◽  
pp. 1115-1117 ◽  
Author(s):  
S.F. Yoon ◽  
B.P. Gay ◽  
H.Q. Zheng ◽  
H.T. Kam ◽  
J. Degenhardt
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