A very low temperature single crystal germanium growth process on insulating substrate using Ni-induced lateral crystallization for three-dimensional integrated circuits
Keyword(s):
2002 ◽
Vol 68
(665)
◽
pp. 21-25
◽
2012 ◽
Vol 59
(7)
◽
pp. 1941-1947
◽
Keyword(s):
Keyword(s):
1991 ◽
Vol 77
(10)
◽
pp. 773-776
◽