Electrical bias stressing and radiation induced charge trapping in HfO2/SiO2 dielectric stacks
1969 ◽
Vol 40
(12)
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pp. 4886-4892
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2014 ◽
Vol 61
(4)
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pp. 2397-2401
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2007 ◽
Vol 54
(6)
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pp. 1883-1890
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2018 ◽
Vol 65
(1)
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pp. 156-163
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2016 ◽
Vol 79
(14)
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pp. 1571-1576
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1997 ◽
Vol 44
(6)
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pp. 1804-1809
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Keyword(s):