Mechanism of leakage current reduction of tantalum oxide capacitors by titanium doping

2007 ◽  
Vol 90 (11) ◽  
pp. 112903 ◽  
Author(s):  
W. S. Lau ◽  
T. S. Tan ◽  
Premila Babu ◽  
Nathan P. Sandler
1990 ◽  
Author(s):  
Satoshi TANIMOTO ◽  
Masahiro MATSUI ◽  
Minoru AOYAGI ◽  
Koichi KAMISAKO ◽  
Koichi KUROIWA ◽  
...  

2005 ◽  
Vol 864 ◽  
Author(s):  
W.S. Lau ◽  
G. Zhang ◽  
L.L. Leong ◽  
P.W. Qian ◽  
Taejoon Han ◽  
...  

AbstractTantalum oxide has attracted world-wide interest for DRAM (dynamic random access memory) capacitor applications because of its relative high dielectric constant compared to silicon dioxide or nitride. We would like to point out that tantalum oxide behaves very much like a large bandgap n-type semiconductor with 3 main types of donors responsible for leakage current. Native oxygen vacancies are very deep double donors with Ec – Ed = 0.8 eV approximately, where Ec is the bottom of the conduction band and Ed is the energy leVel of the defect state. Si-O vacancy complexes are relatively shallow single donors with Ec – Ed = 0.2-0.4 eV. C-O vacancy complexes are relatively shallow single donors with Ec – Ed = 0.5-0.6 eV. The key points regarding how to suppress these 3 types of donor defects will be discussed for the purpose of leakage current reduction.


2006 ◽  
Vol 89 (26) ◽  
pp. 262901 ◽  
Author(s):  
W. S. Lau ◽  
K. K. Khaw ◽  
Taejoon Han ◽  
Nathan P. Sandler

2018 ◽  
Vol 28 (8) ◽  
pp. 440-444
Author(s):  
Kwang-Jin Lee ◽  
◽  
Doyeon Kim ◽  
Duck-Kyun Choi ◽  
Woo-Byoung Kim

2021 ◽  
Vol 57 (15) ◽  
pp. 1907-1910
Author(s):  
Dapeng Liu ◽  
Yiwei Zhao ◽  
Qianqian Shi ◽  
Shilei Dai ◽  
Li Tian ◽  
...  

A solid-state hybrid electrolyte dielectric film was designed for leakage current reduction, synaptic simulation and neuromorphic computing systems.


Author(s):  
Xiaonan Zhu ◽  
Hongliang Wang ◽  
Wenyuan Zhang ◽  
Hanzhe Wang ◽  
Xiaojun Deng ◽  
...  

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