Control of ion species in inductively coupled oxidation plasma by inert gas mixing

2006 ◽  
Vol 100 (11) ◽  
pp. 113303 ◽  
Author(s):  
K. H. Bai ◽  
H. Y. Chang
Keyword(s):  
Inert Gas ◽  
Gas Mixing ◽  
Inductively Coupled ◽  
Ion Species

Control and analysis of ion species in N2 inductively coupled plasma with inert gas mixing

2002 ◽  
Vol 80 (21) ◽  
pp. 3907-3909 ◽  
Author(s):  
K. H. Bai ◽  
D. S. Lee ◽  
H. Y. Chang ◽  
H. S. Uhm
Keyword(s):  
Inductively Coupled Plasma ◽  
Inert Gas ◽  
Gas Mixing ◽  
Inductively Coupled ◽  
Ion Species

Role of inert gas additive on dry etch patterning of InGaP in planar inductively coupled BCl3 plasmas

2004 ◽  
Vol 48 (1) ◽  
pp. 189-192 ◽  
Author(s):  
J.W. Lee ◽  
W.T. Lim ◽  
I.K. Baek ◽  
S.R. Yoo ◽  
M.H. Jeon ◽  
...  
Keyword(s):  
Inert Gas ◽  
Inductively Coupled ◽  
Dry Etch

Wellenabsorption in einem Plasma mit zwei Ionensorten/ Wave Absorption in a Plasma with Two Ion Species

1975 ◽  
Vol 30 (12) ◽  
pp. 1600-1605 ◽  
Author(s):  
H. Schlüter ◽  
G. Schürger
Keyword(s):  
Magnetic Field ◽  
Theoretical Study ◽  
Hydrogen Plasma ◽  
Power Source ◽  
Rf Power ◽  
Neutral Species ◽  
Plasma Cylinder ◽  
Inductively Coupled ◽  
Resistive Loading ◽  
Ion Species

Abstract A theoretical study is carried out for the resistive loading of an rf power source inductively coupled to a plasma cylinder which is immersed in a magnetic field. The plasma is assumed to consist of electrons, two ion and two neutral species. The results are compared with measurements in a hydrogen plasma.

The measurement of nitrogen ion species ratio in inductively coupled plasma source ion implantation

2001 ◽  
Vol 136 (1-3) ◽  
pp. 106-110 ◽  
Author(s):  
Jeonghee Cho ◽  
Seunghee Han ◽  
Yeonhee Lee ◽  
Ok Kyung Kim ◽  
Gon-Ho Kim ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled ◽  
Plasma Source Ion Implantation ◽  
Nitrogen Ion ◽  
Ion Species
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