Hall effect measurements using polycrystalline pentacene field-effect transistors on plastic films

2006 ◽  
Vol 88 (25) ◽  
pp. 253508 ◽  
Author(s):  
Tsuyoshi Sekitani ◽  
Yasushi Takamatsu ◽  
Shintaro Nakano ◽  
Takayasu Sakurai ◽  
Takao Someya
2006 ◽  
Author(s):  
Yasushi Takamatsu ◽  
Tsuyoshi Sekitani ◽  
Shintaro Nakano ◽  
Takayasu Sakurai ◽  
Takao Someya

AIP Advances ◽  
2018 ◽  
Vol 8 (8) ◽  
pp. 085305 ◽  
Author(s):  
Eigo Fujita ◽  
Mitsuru Sometani ◽  
Tetsuo Hatakeyama ◽  
Shinsuke Harada ◽  
Hiroshi Yano ◽  
...  

2020 ◽  
Vol 1004 ◽  
pp. 620-626
Author(s):  
Hironori Takeda ◽  
Mitsuru Sometani ◽  
Takuji Hosoi ◽  
Takayoshi Shimura ◽  
Hiroshi Yano ◽  
...  

Temperature-dependent Hall effect measurements were conducted to investigate the channel conduction mechanisms of 4H-SiC metal-oxide-semiconductor field-effect transistors (MOSFETs). This method allows us to discriminate the impact of the density of mobile (free) carriers in the inversion channels and their net mobility on the performance of SiC MOSFETs. It was found that, while the free carrier ratio of SiC MOSFETs with conventional gate oxides formed by dry oxidation is below 4% at 300 K, increasing the free carrier ratio due to thermal excitation of trapped electrons from SiO2/SiC interfaces leads to an unusual improvement in the field-effect mobility of SiC MOSFETs at elevated temperatures. Specifically, a significant increase in free carrier density surpasses the mobility degradation caused by phonon scattering for thermally grown SiO2/SiC interfaces. It was also found that, although nitrogen incorporation in SiO2/SiC interfaces increases the free carrier ratio typically up to around 30%, introduction of an additional scattering factor associated with interface nitridation compensates for the moderate amount of thermally generated mobile carriers at high temperatures, indicating a fundamental drawback of nitridation of SiO2/SiC interfaces. On the basis of these findings, we discuss the channel conduction mechanisms of SiC MOSFETs.


2012 ◽  
Vol 1430 ◽  
Author(s):  
Hiroaki Yamada ◽  
Takeshi Yoshimura ◽  
Norifumi Fujimura

ABSTRACTThe electronic transport properties of the organic ferroelectric gate field-effect transistors (FeFETs) with the ZnO channel were investigated. The FeFETs with the channel thickness below 100 nm show nonvolatile operation and the on/off ratio of 105. The field-effect mobility decreased with decreasing the channel thickness. From the Hall-effect measurement, it was found that the Hall mobility increases and the carrier concentration decreases after the deposition of the organic ferroelectric gate. From these results, the effect of the ferroelectric polarization on the electronic transport in the FeFETs was discussed.


2004 ◽  
Vol 85 (17) ◽  
pp. 3902-3904 ◽  
Author(s):  
Tsuyoshi Sekitani ◽  
Shingo Iba ◽  
Yusaku Kato ◽  
Takao Someya

Nano Letters ◽  
2018 ◽  
Vol 18 (10) ◽  
pp. 6611-6616 ◽  
Author(s):  
Fangyuan Yang ◽  
Zuocheng Zhang ◽  
Nai Zhou Wang ◽  
Guo Jun Ye ◽  
Wenkai Lou ◽  
...  

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