High rate epitaxy of silicon thick films by medium pressure plasma chemical vapor deposition

M. Kambara; H. Yagi; M. Sawayanagi; T. Yoshida

doi:10.1063/1.2181279

High rate epitaxy of silicon thick films by medium pressure plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.2181279 ◽

2006 ◽

Vol 99 (7) ◽

pp. 074901 ◽

Cited By ~ 33

Author(s):

M. Kambara ◽

H. Yagi ◽

M. Sawayanagi ◽

T. Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thick Films ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Medium Pressure ◽

Pressure Plasma

Download Full-text

High-Rate Deposition of Amorphous Silicon Films by Atmospheric-Pressure Plasma Chemical Vapor Deposition

Crystal Growth Technology ◽

10.1002/0470871687.ch29 ◽

2004 ◽

pp. 645-652 ◽

Cited By ~ 1

Author(s):

Yuzo Mori ◽

Hiroaki Kakiuchi ◽

Kumayasu Yoshii ◽

Kiyoshi Yasutake

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

Download Full-text

Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials

Review of Scientific Instruments ◽

10.1063/1.1305510 ◽

2000 ◽

Vol 71 (8) ◽

pp. 3173-3177 ◽

Cited By ~ 45

Author(s):

Y. Mori ◽

K. Yoshii ◽

H. Kakiuchi ◽

K. Yasutake

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Functional Materials ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

Download Full-text

HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

Download Full-text

Twin-source plasma chemical vapor deposition for high rate deposition of SiO2 films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581427 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2827-2831 ◽

Cited By ~ 1

Author(s):

Ryozo Nonogaki ◽

Shinji Nakai ◽

Suzuya Yamada ◽

Tetsuya Wada

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Sio2 Films ◽

Plasma Chemical Vapor Deposition

Download Full-text

Effect of hydrogen on the structure of high-rate deposited SiC on Si by atmospheric pressure plasma chemical vapor deposition using high-power-density condition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.338 ◽

2006 ◽

Vol 496 (2) ◽

pp. 259-265 ◽

Cited By ~ 11

Author(s):

H. Kakiuchi ◽

H. Ohmi ◽

M. Aketa ◽

K. Yasutake ◽

K. Yoshii ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

High Power Density ◽

Density Condition ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text

Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Cited By ~ 15

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

Si Films

Download Full-text

Nozzle optimization for dissociated species transport in low pressure plasma chemical vapor deposition

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01512626 ◽

1995 ◽

Vol 16 (S1) ◽

pp. S43-S56 ◽

Cited By ~ 3

Author(s):

C. George ◽

G. Candler ◽

R. Young ◽

E. Pfender ◽

J. Heberlein

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Plasma Chemical ◽

Species Transport ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

Low Pressure Plasma

Download Full-text

High rate deposition of diamond-like carbon films by sheet-like plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581693 ◽

1999 ◽

Vol 17 (3) ◽

pp. 731-734 ◽

Cited By ~ 6

Author(s):

Ryozo Nonogaki ◽

Suzuya Yamada ◽

Tsutomu Araki ◽

Tetsuya Wada

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Rate ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text

Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4818150 ◽

2013 ◽

Vol 31 (6) ◽

pp. 061508 ◽

Cited By ~ 2

Author(s):

Mayui Noborisaka ◽

Takanori Mori ◽

Ryohei Horikoshi ◽

Akira Shirakura ◽

Ayako Hashimoto ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Abrasion Resistance ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Polymeric Surfaces ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

Download Full-text

Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing

Surfaces and Interfaces ◽

10.1016/j.surfin.2021.100989 ◽

2021 ◽

Vol 23 ◽

pp. 100989

Author(s):

Zachary Jeckell ◽

Dhruval Patel ◽

Andrew Herschberg ◽

Tag Choi ◽

David Barlaz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Water Intrusion ◽

Pressure Plasma

Download Full-text