Nozzle optimization for dissociated species transport in low pressure plasma chemical vapor deposition

1995 ◽  
Vol 16 (S1) ◽  
pp. S43-S56 ◽  
Author(s):  
C. George ◽  
G. Candler ◽  
R. Young ◽  
E. Pfender ◽  
J. Heberlein
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Plasma Chemical ◽  
Species Transport ◽  
Plasma Chemical Vapor Deposition ◽  
Pressure Plasma ◽  
Low Pressure Plasma

The Development of Polyethylene Naphthalate Films by Low-pressure High-frequency Plasma Chemical Vapor Deposition System with Advance Oxidations Process

2015 ◽  
Vol 18 (1) ◽  
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Polyethylene Naphthalate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
High Frequency Plasma ◽  
Frequency Plasma

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O

High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings

2013 ◽  
Vol 532 ◽  
pp. 44-49 ◽  
Author(s):  
Steffen Günther ◽  
Matthias Fahland ◽  
John Fahlteich ◽  
Björn Meyer ◽  
Steffen Straach ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
High Rate ◽  
Optical Coatings ◽  
Pressure Plasma ◽  
Low Pressure Plasma
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