Twin-source plasma chemical vapor deposition for high rate deposition of SiO2 films

Ryozo Nonogaki; Shinji Nakai; Suzuya Yamada; Tetsuya Wada

doi:10.1116/1.581427

Twin-source plasma chemical vapor deposition for high rate deposition of SiO2 films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581427 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2827-2831 ◽

Cited By ~ 1

Author(s):

Ryozo Nonogaki ◽

Shinji Nakai ◽

Suzuya Yamada ◽

Tetsuya Wada

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Sio2 Films ◽

Plasma Chemical Vapor Deposition

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HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Effect of hydrogen on the structure of high-rate deposited SiC on Si by atmospheric pressure plasma chemical vapor deposition using high-power-density condition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.338 ◽

2006 ◽

Vol 496 (2) ◽

pp. 259-265 ◽

Cited By ~ 11

Author(s):

H. Kakiuchi ◽

H. Ohmi ◽

M. Aketa ◽

K. Yasutake ◽

K. Yoshii ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

High Power Density ◽

Density Condition ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Formation and characterization of the fluorocarbonated-SiO2 films by O2/FTES-helicon plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00073-5 ◽

1999 ◽

Vol 345 (1) ◽

pp. 45-49 ◽

Cited By ~ 11

Author(s):

Kyoung Suk Oh ◽

Min Sung Kang ◽

Kwang-Man Lee ◽

Duk Soo Kim ◽

Chi Kyu Choi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Helicon Plasma ◽

Sio2 Films ◽

Plasma Chemical Vapor Deposition

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High rate deposition of diamond-like carbon films by sheet-like plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581693 ◽

1999 ◽

Vol 17 (3) ◽

pp. 731-734 ◽

Cited By ~ 6

Author(s):

Ryozo Nonogaki ◽

Suzuya Yamada ◽

Tsutomu Araki ◽

Tetsuya Wada

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Rate ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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High-Rate Deposition of Amorphous Silicon Films by Atmospheric-Pressure Plasma Chemical Vapor Deposition

Crystal Growth Technology ◽

10.1002/0470871687.ch29 ◽

2004 ◽

pp. 645-652 ◽

Cited By ~ 1

Author(s):

Yuzo Mori ◽

Hiroaki Kakiuchi ◽

Kumayasu Yoshii ◽

Kiyoshi Yasutake

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

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Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials

Review of Scientific Instruments ◽

10.1063/1.1305510 ◽

2000 ◽

Vol 71 (8) ◽

pp. 3173-3177 ◽

Cited By ~ 45

Author(s):

Y. Mori ◽

K. Yoshii ◽

H. Kakiuchi ◽

K. Yasutake

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Functional Materials ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

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High rate epitaxy of silicon thick films by medium pressure plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.2181279 ◽

2006 ◽

Vol 99 (7) ◽

pp. 074901 ◽

Cited By ~ 33

Author(s):

M. Kambara ◽

H. Yagi ◽

M. Sawayanagi ◽

T. Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thick Films ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Medium Pressure ◽

Pressure Plasma

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Investigation of deposition characteristics and properties of high-rate deposited silicon nitride films prepared by atmospheric pressure plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.11.104 ◽

2005 ◽

Vol 479 (1-2) ◽

pp. 17-23 ◽

Cited By ~ 31

Author(s):

H. Kakiuchi ◽

Y. Nakahama ◽

H. Ohmi ◽

K. Yasutake ◽

K. Yoshii ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films

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High-Rate Deposition of High-Quality, Thick Cubic Boron Nitride Films by Bias-Assisted DC Jet Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.l442 ◽

2000 ◽

Vol 39 (Part 2, No. 5B) ◽

pp. L442-L444 ◽

Cited By ~ 116

Author(s):

Seiichiro Matsumoto ◽

Wenjun Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Jet Plasma ◽

Boron Nitride Films

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High-Rate Deposition of Amorphous SiC Films by Atmospheric Pressure Plasma Chemical Vapor Deposition (2nd Report)

Journal of the Japan Society for Precision Engineering Contributed Papers ◽

10.2493/jspe.70.1075 ◽

2004 ◽

Vol 70 (8) ◽

pp. 1075-1079

Author(s):

Hiroaki KAKIUCHI ◽

Hiromasa OHMI ◽

Koichi NAKAZAWA ◽

Kiyoshi YASUTAKE ◽

Kumayasu YOSHII ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Sic ◽

Sic Films

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