Effect of Oxide Thickness and Nitridation Process on PMOS Gate and Drain Low Frequency Noise

2005 ◽  
Author(s):  
F. Martinez
Keyword(s):  
Low Frequency ◽  
Oxide Thickness ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Nitridation Process

Low-Frequency Noise Characterization of Ultra-Low Equivalent-Oxide-Thickness Thulium Silicate Interfacial Layer nMOSFETs

2015 ◽  
Vol 36 (12) ◽  
pp. 1355-1358 ◽  
Author(s):  
Maryam Olyaei ◽  
Eugenio Dentoni Litta ◽  
Per-Erik Hellstrom ◽  
Mikael Ostling ◽  
Bengt Gunnar Malm
Keyword(s):  
Interfacial Layer ◽  
Low Frequency ◽  
Oxide Thickness ◽  
Frequency Noise ◽  
Equivalent Oxide Thickness ◽  
Low Frequency Noise ◽  
Noise Characterization

INSTRUMENTATION DESIGN FOR CROSS-CORRELATION MEASUREMENTS BETWEEN GATE AND DRAIN LOW FREQUENCY NOISE IN MOSFETS

2010 ◽  
Vol 09 (03) ◽  
pp. 313-322 ◽  
Author(s):  
G. GIUSI ◽  
F. CRUPI ◽  
C. CIOFI ◽  
C. PACE ◽  
P. MAGNONE
Keyword(s):  
Cross Correlation ◽  
Low Frequency ◽  
Oxide Thickness ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Transimpedance Amplifiers ◽  
Natural Choice ◽  
Drain Side ◽  
Voltage Saturation ◽  
Ultrathin Oxide

A two-channel measurement system suited for the on-wafer characterization of the gate and drain low frequency noise in MOSFETs is presented. Guidelines for designing the preamplifier and the bias stage at the drain and gate terminals are discussed. Results show that, the natural choice of employing transimpedance amplifiers as first preamplifier stage is useful only at the gate side, while it is preferable the use of voltage preamplifiers at the drain side to avoid voltage saturation. A simple prototype which implements the proposed design approach is reported. The system capability is tested through the measurement of the gate noise, the drain noise and the cross-correlation between the two channels in nMOSFETs with ultrathin oxide thickness.

Estimating the Quality of Thermionic Cathodes for Microwave Vacuum Tubes Using the Low-Frequency Noise Parameters

Vestnik MEI ◽  
2018 ◽  
Vol 5 (5) ◽  
pp. 120-127
Author(s):  
Mikhail D. Vorobyev ◽  
◽  
Dmitriy N. Yudaev ◽  
Andrey Yu. Zorin ◽  
◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Noise Parameters ◽  
Thermionic Cathodes ◽  
Vacuum Tubes

Simulation of Low Frequency Noise in a CCTWT

1999 ◽  
Author(s):  
Charles K. Birdsall ◽  
J. P. Varboncoeur ◽  
P. J. Christensen
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise
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