Role of growth conditions on magnetic properties of AlCrN grown by molecular beam epitaxy

2005 ◽  
Vol 86 (5) ◽  
pp. 052101 ◽  
Author(s):  
R. M. Frazier ◽  
G. T. Thaler ◽  
J. Y. Leifer ◽  
J. K. Hite ◽  
B. P. Gila ◽  
...  
2011 ◽  
Vol 1290 ◽  
Author(s):  
J. K. Mishra ◽  
S. Dhar ◽  
M. A. Khaderabad ◽  
O. Brandt

ABSTRACTGd:GaN layers grown with different Gd concentrations by molecular beam epitaxy (MBE) are studied using photoconductivity and photo-thermoelectric power spectroscopy. Our study reveals that the incorporation of Gd produces a large concentration of acceptor-like defects in the GaN lattice. The defect band is found to be located ~450meV above the valence band. Moreover, the concentration of defects is found to increase with the Gd concentration. The effect of annealing on the structural and the magnetic properties of GaN implanted with Gd is also investigated. A clear correlation between the saturation magnetization and the defect density is observed in implanted samples. The colossal magnetic moment per Gd ion and the ferromagnetism observed in this material is explained in terms of the formation of giant defect cluster around each Gd ion.


2005 ◽  
Vol 202 (6) ◽  
pp. 1135-1144 ◽  
Author(s):  
Muhammad B. Haider ◽  
Costel Constantin ◽  
Hamad Al-Brithen ◽  
Gabriel Caruntu ◽  
Charles J. O'Connor ◽  
...  

2003 ◽  
Vol 93 (5) ◽  
pp. 2987-2995 ◽  
Author(s):  
O. Ersen ◽  
V. Parasote ◽  
V. Pierron-Bohnes ◽  
M. C. Cadeville ◽  
C. Ulhaq-Bouillet

2002 ◽  
Vol 246 (1-2) ◽  
pp. 55-63 ◽  
Author(s):  
E Haus ◽  
I.P Smorchkova ◽  
B Heying ◽  
P Fini ◽  
C Poblenz ◽  
...  

2021 ◽  
pp. 2100438
Author(s):  
Wouter Mortelmans ◽  
Karel De Smet ◽  
Ruishen Meng ◽  
Michel Houssa ◽  
Stefan De Gendt ◽  
...  

1987 ◽  
Vol 94 ◽  
Author(s):  
S. B. Ogale ◽  
M. Thomsen ◽  
A. Madhukar

ABSTRACTComputer simulations of III-V molecular beam epitaxy (MBE) show that surface reconstruction induced modulation of kinetic rates could give rise to ordering in alloys. Results are also presented for the possible influence of an external ion beam in achieving low temperature epitaxy as well as smoother growth front under usual conditions.


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