High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

2004 ◽  
Vol 85 (18) ◽  
pp. 4112-4114 ◽  
Author(s):  
Seong Keun Kim ◽  
Wan-Don Kim ◽  
Kyung-Min Kim ◽  
Cheol Seong Hwang ◽  
Jaehack Jeong
2006 ◽  
Vol 510 (1-2) ◽  
pp. 159-163 ◽  
Author(s):  
Yongtaek Hwang ◽  
Kyuyoung Heo ◽  
Chang Hwan Chang ◽  
Man Kil Joo ◽  
Moonhor Ree

2006 ◽  
Vol 89 (13) ◽  
pp. 133512 ◽  
Author(s):  
Kyoung H. Kim ◽  
Damon B. Farmer ◽  
Jean-Sebastien M. Lehn ◽  
P. Venkateswara Rao ◽  
Roy G. Gordon

Author(s):  
Dohyun Go ◽  
Jaehyeong Lee ◽  
Jeong Woo Shin ◽  
Sungje Lee ◽  
Wangu Kang ◽  
...  

2020 ◽  
Vol 32 (4) ◽  
pp. 1393-1407
Author(s):  
Maxime E. Dufond ◽  
Maïmouna W. Diouf ◽  
Clémence Badie ◽  
Carine Laffon ◽  
Philippe Parent ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document