High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition
2008 ◽
Vol 11
(3)
◽
pp. G9
◽
Keyword(s):
2001 ◽
Vol 148
(4)
◽
pp. F63
◽
2017 ◽
Vol 109
◽
pp. 852-859
◽
Keyword(s):
2007 ◽
Vol 50
(6)
◽
pp. 1827
◽
Keyword(s):