Real-time observation of initial stages of copper film growth on silicon oxide using reflection high-energy electron diffraction

2004 ◽  
Vol 96 (12) ◽  
pp. 7071-7079 ◽  
Author(s):  
Jason T. Drotar ◽  
T.-M. Lu ◽  
G.-C. Wang
Keyword(s):  
Electron Diffraction ◽  
Real Time ◽  
Silicon Oxide ◽  
Film Growth ◽  
Copper Film ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Time Observation ◽  
Real Time Observation

Etching of diamond (100) surface by atomic hydrogen: Real-time observation by reflection high energy electron diffraction

1998 ◽  
Vol 16 (2) ◽  
pp. 749-753 ◽  
Author(s):  
Shojiro Komatsu ◽  
Katsuyuki Okada ◽  
Sung-Baek Chou ◽  
Takashi Aizawa ◽  
Hisashi Shigetani ◽  
...  
Keyword(s):  
Electron Diffraction ◽  
Real Time ◽  
Atomic Hydrogen ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Time Observation ◽  
Real Time Observation

Reflected High Energy Electron Diffraction Optimizing GaSb Film Growth Process

2020 ◽  
Vol 57 (23) ◽  
pp. 231603
Author(s):  
房丹 Fang Dan ◽  
张强 Zhang Qiang ◽  
李含 Li Han ◽  
谷开慧 Gu Kaihui
Keyword(s):  
Electron Diffraction ◽  
Growth Process ◽  
Film Growth ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron

RHEED Study of the Texture in Polycrystalline Films of Magnetite Grown on Oxidized Silicon Surface

2016 ◽  
Vol 247 ◽  
pp. 118-123
Author(s):  
Vyacheslav V. Balashev ◽  
Victor A. Vikulov ◽  
Tatiana A. Pisarenko ◽  
Vladimir V. Korobtsov
Keyword(s):  
Electron Diffraction ◽  
Oxygen Pressure ◽  
Silicon Surface ◽  
Film Growth ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Polycrystalline Films ◽  
Reactive Deposition ◽  
Lower Oxygen

Polycrystalline films of magnetite (Fe3O4) with thickness of 75 nm were grown on SiO2/Si (001) surface by reactive deposition of Fe in O2 atmosphere. The growth of Fe3O4 films was conducted with the different oxygen pressures. The structure of films was monitored by reflection high-energy electron diffraction (RHEED) during the film growth. It was found that there is a range of oxygen pressure in which the growth of only textured Fe3O4 film takes place. Reactive deposition of Fe at lower oxygen pressure results in a growth of Fe3O4 film without a texture. In contrast at the deposition with higher oxygen pressure the texture in the Fe3O4 film remains but the appearance of hematite (α-Fe2O3) is observed.

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