Ultrathin film growth of silicides studied using microprobe reflection high‐energy electron diffraction and Auger

1989 ◽  
Vol 7 (3) ◽  
pp. 2174-2179 ◽  
Author(s):  
P. A. Bennett ◽  
J. R. Butler ◽  
X. Tong
Keyword(s):  
Electron Diffraction ◽  
Film Growth ◽  
High Energy ◽  
Ultrathin Film ◽  
Energy Electron ◽  
High Energy Electron

Reflected High Energy Electron Diffraction Optimizing GaSb Film Growth Process

2020 ◽  
Vol 57 (23) ◽  
pp. 231603
Author(s):  
房丹 Fang Dan ◽  
张强 Zhang Qiang ◽  
李含 Li Han ◽  
谷开慧 Gu Kaihui
Keyword(s):  
Electron Diffraction ◽  
Growth Process ◽  
Film Growth ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron

RHEED Study of the Texture in Polycrystalline Films of Magnetite Grown on Oxidized Silicon Surface

2016 ◽  
Vol 247 ◽  
pp. 118-123
Author(s):  
Vyacheslav V. Balashev ◽  
Victor A. Vikulov ◽  
Tatiana A. Pisarenko ◽  
Vladimir V. Korobtsov
Keyword(s):  
Electron Diffraction ◽  
Oxygen Pressure ◽  
Silicon Surface ◽  
Film Growth ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Polycrystalline Films ◽  
Reactive Deposition ◽  
Lower Oxygen

Polycrystalline films of magnetite (Fe3O4) with thickness of 75 nm were grown on SiO2/Si (001) surface by reactive deposition of Fe in O2 atmosphere. The growth of Fe3O4 films was conducted with the different oxygen pressures. The structure of films was monitored by reflection high-energy electron diffraction (RHEED) during the film growth. It was found that there is a range of oxygen pressure in which the growth of only textured Fe3O4 film takes place. Reactive deposition of Fe at lower oxygen pressure results in a growth of Fe3O4 film without a texture. In contrast at the deposition with higher oxygen pressure the texture in the Fe3O4 film remains but the appearance of hematite (α-Fe2O3) is observed.

ENERGY-FILTERED RHEED AND REELS FOR IN SITU REAL TIME ANALYSIS DURING FILM GROWTH

1997 ◽  
Vol 04 (03) ◽  
pp. 525-534 ◽  
Author(s):  
HARRY A. ATWATER ◽  
C. C. AHN ◽  
S. S. WONG ◽  
G. HE ◽  
H. YOSHINO ◽  
...  
Keyword(s):  
Electron Diffraction ◽  
Energy Loss ◽  
Electron Energy ◽  
Structure Determination ◽  
Electron Energy Loss Spectroscopy ◽  
Film Growth ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Electron Energy Loss

Energy-filtered reflection high energy electron diffraction and reflection electron energy loss spectroscopy expand the usefulness of reflection high energy electron diffraction for quantitative structure determination and surface spectroscopy during film growth. Several implementations of energy-filtered reflection high energy electron diffraction are discussed, along with the progress and prospects for structure determination. New developments in parallel detection reflection electron energy loss spectroscopy (PREELS) enable the use of this method to obtain surface-spectroscopic information in real time during thin film growth, greatly expanding the range of surface information available during growth.

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