The photosensitivity and ultraviolet absorption change of Sn-doped silica film fabricated by modified chemical vapor deposition

2004 ◽  
Vol 96 (11) ◽  
pp. 6153-6158 ◽  
Author(s):  
Guanghui Chen ◽  
Yigang Li ◽  
Liying Liu ◽  
Yaoji He ◽  
Lei Xu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Film ◽  
Ultraviolet Absorption ◽  
Absorption Change

Mechanism of Amorphous Silica Film Formation from Tetraethoxysilane in Atomic Oxygen‐Induced Chemical Vapor Deposition

1998 ◽  
Vol 145 (8) ◽  
pp. 2866-2876 ◽  
Author(s):  
Aleksander M. Wróbel ◽  
Agnieszka Walkiewicz‐Pietrzykowska ◽  
Sunil Wickramanayaka ◽  
Yoshinori Hatanaka
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Silica ◽  
Vapor Deposition ◽  
Atomic Oxygen ◽  
Film Formation ◽  
Chemical Vapor ◽  
Silica Film

SiO2 Film Coatings with VUV Excimer Lamp CVD

1998 ◽  
Vol 555 ◽  
Author(s):  
K. Kurosawa ◽  
N. Takezoe ◽  
H. Yanagida ◽  
R. Nomura ◽  
A. Yokotani
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Film ◽  
Sio2 Film ◽  
Single Crystal Substrate ◽  
Excimer Lamp ◽  
Film Coatings ◽  
Crystal Substrate ◽  
Optical Applications

AbstractSilica film coatings were demonstrated using photo-chemical vapor deposition with a 172-nm Xe excimer lamp. Tetraethoxyorthosilicate (TEOS) molecules were successfully dissociated into SiO2+2C2H5-OH+;(residual C and H) with the 7.2-eV photons. The films were deposited onto a quartz or Al203 single crystal substrate with the deposition rate of 1 nm/min. The films were uniform and smooth enough for optical applications.

Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps

2000 ◽  
Vol 168 (1-4) ◽  
pp. 37-40 ◽  
Author(s):  
K. Kurosawa ◽  
N. Takezoe ◽  
H. Yanagida ◽  
J. Miyano ◽  
Y. Motoyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Vacuum Ultraviolet ◽  
Chemical Vapor ◽  
Silica Film ◽  
Excimer Lamps ◽  
Film Preparation

scholarly journals Ultraviolet absorption in modified chemical vapor deposition preforms

1994 ◽  
Vol 11 (10) ◽  
pp. 2106 ◽  
Author(s):  
L. Dong ◽  
J. Pinkstone ◽  
P. St. J. Russell ◽  
D. N. Payne
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Ultraviolet Absorption

Conversion of tetraethoxysilane (TEOS) to silica film-forming precursors in atomic oxygen-induced chemical vapor deposition

1996 ◽  
Vol 2 (6) ◽  
pp. 285-291 ◽  
Author(s):  
Aleksander M. Wróbel ◽  
Agnieszka Walkiewicz-Pietrzykowska ◽  
Marek Stasiak ◽  
Józef Kulpiúski
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atomic Oxygen ◽  
Chemical Vapor ◽  
Silica Film ◽  
Film Forming
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