Microwave plasma source as an ion beam neutralizer

2004 ◽  
Vol 75 (5) ◽  
pp. 1684-1686 ◽  
Author(s):  
M. Medhisuwakul ◽  
D. Boonyawan ◽  
T. Vilaithong ◽  
J. Engemann
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Source

A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System

2005 ◽  
Vol 107 ◽  
pp. 21-24 ◽  
Author(s):  
M. Medhisuwakul ◽  
Thiraphat Vilaithong ◽  
Jürgen Engemann
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Source ◽  
Ion Source ◽  
Simulation Software ◽  
Ion Current ◽  
Extraction System ◽  
Beam Shape ◽  
Ion Extraction ◽  
Argon Ion

A 13.56 MHz radio-frequency (rf) driven multicusp ion source has been constructed [1] to produce a high argon ion current density. Milliampere-range argon ion current can be extracted from the source. An in-waveguide microwave plasma source has been utilized as the ion beam neutralizer [2]. The neutralization source was placed 20 cm downstream from the extraction system. With the former extraction system, comprised of extraction electrodes and an Einzel lens, the electrons from the neutralizer were attracted to the high positive potential of the lens. Consequently, the potential of the lens drops and the beam is diverged. To suppress electrons from being accelerated to the Einzel lens a negatively biased electrode was placed before the last electrode, which is grounded, to produce a retarding electric field for electrons. The hole of the electrode was made small to make sure that the potential at the center is negative enough to suppress electrons. All simulations have been performed with the KOBRA3-INP simulation software. The results of the beam shape from the simulation will be presented.

Microwave plasma source for high current ion beam neutralization

2000 ◽  
Vol 71 (2) ◽  
pp. 800-803 ◽  
Author(s):  
D. Korzec ◽  
A. Müller ◽  
J. Engemann
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Source ◽  
High Current

Numerical analysis and optimization of the microwave plasma source for ion beam neutralization

2006 ◽  
Vol 15 (3) ◽  
pp. 396-401 ◽  
Author(s):  
M Medhisuwakul ◽  
S Kytzia ◽  
J Engemann ◽  
T Vilaithong
Keyword(s):  
Numerical Analysis ◽  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Source

Extraction of an ion beam from a diverter‐type plasma source

1977 ◽  
Vol 48 (5) ◽  
pp. 571-572 ◽  
Author(s):  
K. Yatsu ◽  
Y. Nozaki ◽  
S. Hagiwara ◽  
S. Miyoshi
Keyword(s):  
Ion Beam ◽  
Plasma Source

Simple low‐cost microwave plasma source

1986 ◽  
Vol 57 (2) ◽  
pp. 164-166 ◽  
Author(s):  
L. G. Meiners ◽  
D. B. Alford
Keyword(s):  
Microwave Plasma ◽  
Low Cost ◽  
Plasma Source

scholarly journals A Linear Microwave Plasma Source Using a Circular Waveguide Filled with a Relatively High-Permittivity Dielectric: Comparison with a Conventional Quasi-Coaxial Line Waveguide

2021 ◽  
Vol 11 (12) ◽  
pp. 5358
Author(s):  
Ju-Hong Cha ◽  
Sang-Woo Kim ◽  
Ho-Jun Lee
Keyword(s):  
Electron Density ◽  
Microwave Plasma ◽  
Circular Waveguide ◽  
Coaxial Line ◽  
Plasma Source ◽  
Tangential Plane ◽  
High Permittivity ◽  
Deposition Area ◽  
Extended Plasma ◽  
Transverse Electromagnetic

For a conventional linear microwave plasma source (LMPS) with a quasi-coaxial line transverse electromagnetic (TEM) waveguide, a linearly extended plasma is sustained by the surface wave outside the tube. Due to the characteristics of the quasi-coaxial line MPS, it is easy to generate a uniform plasma with radially omnidirectional surfaces, but it is difficult to maximize the electron density in a curved selected region. For the purpose of concentrating the plasma density in the deposition area, a novel LMPS which is suitable for curved structure deposition has been developed and compared with the conventional LMPS. As the shape of a circular waveguide, it is filled with relatively high-permittivity dielectric instead of a quasi-coaxial line waveguide. Microwave power at 2.45 GHz is transferred to the plasma through the continuous cylindrical-slotted line antenna, and the radiated electric field in the radial direction is made almost parallel to the tangential plane of the window surface. This research includes the advanced 3D numerical analysis and compares the results with the experiment. It shows that the electron density in the deposition area is higher than that of the conventional quasi-coaxial line plasma MPS.

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