X-ray photoelectron spectroscopy of nitromethane adsorption products on Si(100): A model for N 1s core-level shifts in silicon oxynitride films
2001 ◽
Vol 148
(7)
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pp. F140
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Keyword(s):
1999 ◽
Vol 17
(4)
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pp. 1086-1090
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2011 ◽
Vol 675-677
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pp. 15-19
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