Stress hysteresis and mechanical properties of plasma-enhanced chemical vapor deposited dielectric films

2004 ◽  
Vol 95 (3) ◽  
pp. 967-976 ◽  
Author(s):  
Jeremy Thurn ◽  
Robert F. Cook ◽  
Mallika Kamarajugadda ◽  
Steven P. Bozeman ◽  
Laura C. Stearns
Keyword(s):  
Mechanical Properties ◽  
Chemical Vapor ◽  
Dielectric Films ◽  
Chemical Vapor Deposited ◽  
Stress Hysteresis

Thickness-dependent Structural Relaxation of Plasma-Enhanced Chemical Vapor Deposited Silicon Oxide Films during Thermal Processing

2004 ◽  
Vol 854 ◽  
Author(s):  
Zhiqiang Cao ◽  
Xin Zhang
Keyword(s):  
Thermal Processing ◽  
Microelectromechanical Systems ◽  
Silicon Oxide ◽  
Coefficient Of Thermal Expansion ◽  
Chemical Vapor ◽  
Thickness Effect ◽  
Dielectric Films ◽  
Chemical Vapor Deposited ◽  
Amorphous Dielectric ◽  
Stress Hysteresis

ABSTRACTThis paper presents a microstructure-based mechanism which elucidates seams as a source of density change and voids as a source of plastic deformation, accompanied by a viscous flow. This theory was then applied to explain a series of experimental results that are related to thermal cycling of amorphous dielectric films, such as plasma-enhanced physical vapor deposited (PECVD) silicon oxide (SiOx) films, including stress hysteresis generation and reduction and coefficient of thermal-expansion changes. In particular, the thickness effect was examined; PECVD SiOx films with a thickness varying from 1 to 40 m were studied, as certain demanding applications in Microelectromechanical Systems (MEMS) require such thick films serving as heat/electrical insulation layers.

Effect of low-frequency radio frequency on plasma-enhanced chemical vapor deposited ultra low-κ dielectric films for very large-scale integrated interconnects

2014 ◽  
Vol 115 (14) ◽  
pp. 144107 ◽  
Author(s):  
E. Todd Ryan ◽  
Stephen M. Gates ◽  
Stephan A. Cohen ◽  
Yuri Ostrovski ◽  
Ed Adams ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Large Scale ◽  
Low Frequency ◽  
Chemical Vapor ◽  
Dielectric Films ◽  
Chemical Vapor Deposited

scholarly journals Atomic arrangement and mechanical properties of chemical-vapor-deposited amorphous boron

2020 ◽  
Vol 193 ◽  
pp. 108856 ◽  
Author(s):  
Jessica M. Maita ◽  
Gyuho Song ◽  
Mariel Colby ◽  
Seok-Woo Lee
Keyword(s):  
Mechanical Properties ◽  
Chemical Vapor ◽  
Amorphous Boron ◽  
Atomic Arrangement ◽  
Chemical Vapor Deposited

Mechanical Properties of Chemical-Vapor-Deposited Silicon Carbide using a Nanoindentation Technique

2008 ◽  
Vol 45 (9) ◽  
pp. 518-523 ◽  
Author(s):  
Jong-Ho Kim ◽  
Hyeon-Keun Lee ◽  
Ji-Yeon Park ◽  
Weon-Ju Kim ◽  
Do-Kyung Kim
Keyword(s):  
Mechanical Properties ◽  
Silicon Carbide ◽  
Chemical Vapor ◽  
Nanoindentation Technique ◽  
Chemical Vapor Deposited
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