scholarly journals Mechanism for the increase of indium-tin-oxide work function by O2 inductively coupled plasma treatment

2004 ◽  
Vol 95 (2) ◽  
pp. 586-590 ◽  
Author(s):  
Kwang Ho Lee ◽  
Ho Won Jang ◽  
Ki-Beom Kim ◽  
Yoon-Heung Tak ◽  
Jong-Lam Lee
Keyword(s):  
Plasma Treatment ◽  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled

High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma

1994 ◽  
Vol 33 (Part 1, No. 7B) ◽  
pp. 4438-4441 ◽  
Author(s):  
Keiji Nakamura ◽  
Tomonori Imura ◽  
Hideo Sugai ◽  
Michiko Ohkubo ◽  
Katsutaro Ichihara
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Inductively Coupled Plasma ◽  
High Speed ◽  
Oxide Thin Films ◽  
Inductively Coupled

Enhanced Work Function of Al-Doped Zinc-Oxide Thin Films by Oxygen Inductively Coupled Plasma Treatment

2014 ◽  
Vol 16 (1) ◽  
pp. 79-82 ◽  
Author(s):  
Zebin Li ◽  
Zhonghang Wu ◽  
Jiaqi Ju ◽  
Kongduo He ◽  
Zhenliu Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Plasma Treatment ◽  
Work Function ◽  
Inductively Coupled Plasma ◽  
Oxide Thin Films ◽  
Inductively Coupled

Surface properties of indium tin oxide treated by Cl 2 inductively coupled plasma

2014 ◽  
Vol 316 ◽  
pp. 214-221 ◽  
Author(s):  
Kongduo He ◽  
Xilu Yang ◽  
Hang Yan ◽  
Junyi Gong ◽  
Shaofeng Zhong ◽  
...  
Keyword(s):  
Surface Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled
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