Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography

2010 ◽  
Vol 28 (4) ◽  
pp. 761-765 ◽  
Author(s):  
Y. R. Park ◽  
J. H. Ahn ◽  
J. S. Kim ◽  
B. S. Kwon ◽  
N.-E. Lee ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Inductively Coupled Plasma ◽  
Extreme Ultraviolet ◽  
Binary Mask ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Optical Performance of Extreme Ultraviolet Lithography Mask with an Indium Tin Oxide Absorber

2012 ◽  
Vol 12 (4) ◽  
pp. 3330-3333 ◽  
Author(s):  
Hee Young Kang ◽  
Sungjin Park ◽  
Chang Kwon Hwangbo ◽  
Hwan-Seok Seo ◽  
Seong-Su Kim ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Optical Performance ◽  
Ultraviolet Lithography

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Binary mask designs with single- and double-layer absorber stacks for extreme ultraviolet lithography and actinic inspection

2013 ◽  
Vol 53 (4) ◽  
pp. A42 ◽  
Author(s):  
Sungjin Park ◽  
Jai Dong Lim ◽  
Pazhanisami Peranantham ◽  
Hee Young Kang ◽  
Chang Kwon Hwangbo ◽  
...  
Keyword(s):  
Double Layer ◽  
Extreme Ultraviolet ◽  
Binary Mask ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

2009 ◽  
Vol 517 (14) ◽  
pp. 3859-3861 ◽  
Author(s):  
Byung-Jae Kim ◽  
Hyunjung Jung ◽  
Hong-Yeol Kim ◽  
Joona Bang ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Nanosphere Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching

2015 ◽  
Vol 32 (5) ◽  
pp. 058102 ◽  
Author(s):  
Ying Cheng ◽  
Ji-Jun Zou ◽  
Ming Wan ◽  
Wei-Lu Wang ◽  
Xin-Cun Peng ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Factors Affecting ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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