Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties

J. Neidhardt; Zs. Czigány; I. F. Brunell; L. Hultman

doi:10.1063/1.1538316

Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties

Journal of Applied Physics ◽

10.1063/1.1538316 ◽

2003 ◽

Vol 93 (5) ◽

pp. 3002-3015 ◽

Cited By ~ 76

Author(s):

J. Neidhardt ◽

Zs. Czigány ◽

I. F. Brunell ◽

L. Hultman

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Carbon Nitride ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Thin Solid Films ◽

Solid Films

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Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering; suppression of the chemical desorption processes

Thin Solid Films ◽

10.1016/j.tsf.2004.09.055 ◽

2005 ◽

Vol 478 (1-2) ◽

pp. 34-41 ◽

Cited By ~ 15

Author(s):

J. Neidhardt ◽

H. Högberg ◽

L. Hultman

Keyword(s):

Magnetron Sputtering ◽

Carbon Nitride ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Thin Solid Films ◽

Solid Films

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Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(88)90048-6 ◽

1988 ◽

Vol 92 (3-4) ◽

pp. 639-656 ◽

Cited By ~ 104

Author(s):

L. Hultman ◽

S.A. Barnett ◽

J.-E. Sundgren ◽

J.E. Greene

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Films

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Low‐energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577428 ◽

1991 ◽

Vol 9 (3) ◽

pp. 434-438 ◽

Cited By ~ 148

Author(s):

L. Hultman ◽

W.‐D. Münz ◽

J. Musil ◽

S. Kadlec ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Ion Flux ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Film Microstructure

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Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.353388 ◽

1993 ◽

Vol 73 (12) ◽

pp. 8580-8589 ◽

Cited By ~ 134

Author(s):

F. Adibi ◽

I. Petrov ◽

J. E. Greene ◽

L. Hultman ◽

J.‐E. Sundgren

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

High Vacuum ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Ultra High Vacuum ◽

High Flux ◽

Reactive Magnetron

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Epitaxial growth of metastable δ-TaN layers on MgO(001) using low-energy, high-flux ion irradiation during ultrahigh vacuum reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1513639 ◽

2002 ◽

Vol 20 (6) ◽

pp. 2007 ◽

Cited By ~ 32

Author(s):

C.-S. Shin ◽

Y.-W. Kim ◽

N. Hellgren ◽

D. Gall ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Epitaxial Growth ◽

Ion Irradiation ◽

Ultrahigh Vacuum ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

High Flux ◽

Reactive Magnetron

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Low‐energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive‐magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.338257 ◽

1987 ◽

Vol 61 (2) ◽

pp. 552-555 ◽

Cited By ~ 96

Author(s):

L. Hultman ◽

U. Helmersson ◽

S. A. Barnett ◽

J.‐E. Sundgren ◽

J. E. Greene

Keyword(s):

Magnetron Sputtering ◽

Film Growth ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Defect Densities

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Summary Abstract: The role of low‐energy ion bombardment during the growth of epitaxial TiN(100) films by reactive magnetron sputtering: Defect formation and annihilation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574946 ◽

1987 ◽

Vol 5 (4) ◽

pp. 2162-2164 ◽

Cited By ~ 4

Author(s):

L. Hultman ◽

U. Helmersson ◽

S. A. Barnett ◽

J.‐E. Sundgren ◽

J. E. Greene

Keyword(s):

Magnetron Sputtering ◽

Defect Formation ◽

Ion Bombardment ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

Journal of Applied Physics ◽

10.1063/1.1510558 ◽

2002 ◽

Vol 92 (9) ◽

pp. 5084-5093 ◽

Cited By ~ 67

Author(s):

C.-S. Shin ◽

D. Gall ◽

Y.-W. Kim ◽

N. Hellgren ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Surface Interactions ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Effect of SiC thickness on microstructure and mechanical properties of (AlCrTiZrV)N/SiC nano-multilayers film synthesized by reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2021.138724 ◽

2021 ◽

pp. 138724

Author(s):

Bohan Li ◽

Xun Ma ◽

Wei Li ◽

Qingqing Zhai ◽

Ping Liu ◽

...

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microstructure And Mechanical Properties

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Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

Physica B Condensed Matter ◽

10.1016/j.physb.2011.01.077 ◽

2011 ◽

Vol 406 (13) ◽

pp. 2658-2662 ◽

Cited By ~ 8

Author(s):

Chaoquan Hu ◽

Liang Qiao ◽

Hongwei Tian ◽

Xianyi Lu ◽

Qing Jiang ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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