Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering; suppression of the chemical desorption processes

2005 ◽  
Vol 478 (1-2) ◽  
pp. 34-41 ◽  
Author(s):  
J. Neidhardt ◽  
H. Högberg ◽  
L. Hultman
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thin Solid Films ◽  
Solid Films

Study of the thermal stability of carbon nitride thin films prepared by reactive magnetron sputtering

2000 ◽  
Vol 9 (2) ◽  
pp. 212-218 ◽  
Author(s):  
C. Fernández-Ramos ◽  
M.J. Sayagués ◽  
T.C. Rojas ◽  
M.D. Alcalá ◽  
C. Real ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

Characterisation of carbon nitride thin films prepared by reactive magnetron sputtering

Carbon ◽  
1998 ◽  
Vol 36 (5-6) ◽  
pp. 761-764 ◽  
Author(s):  
A. Fernández ◽  
J.C. Sánchez-López ◽  
G. Lassaletta
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

New approach to understanding the reactive magnetron sputtering of hard carbon nitride films

2000 ◽  
Vol 9 (3-6) ◽  
pp. 582-586 ◽  
Author(s):  
Jaroslav Vlček ◽  
Karel Rusňák ◽  
Václav Hájek ◽  
Ludvík Martinů
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Hard Carbon ◽  
New Approach

Thermal Analysis on the Amorphous Carbon Nitride Prepared by Reactive Magnetron Sputtering

2000 ◽  
Vol 39 (Part 2, No. 5A) ◽  
pp. L420-L422 ◽  
Author(s):  
Xing-Cheng Xiao ◽  
Wei-Hui Jiang ◽  
Li-Xin Song ◽  
Xing-Fang Hu ◽  
Chang-Wei Lu
Keyword(s):  
Thermal Analysis ◽  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Amorphous Carbon Nitride

Growth of CNxHy films by reactive magnetron sputtering of carbon in Ar/NH3 discharges

1996 ◽  
Vol 11 (4) ◽  
pp. 981-988 ◽  
Author(s):  
H. Sjöström ◽  
W. Lanford ◽  
B. Hjörvarson ◽  
K. Xing ◽  
J-E. Sundgren
Keyword(s):  
Magnetron Sputtering ◽  
Growth Temperature ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Film Growth ◽  
Power Spectra ◽  
Reactive Magnetron Sputtering ◽  
Nuclear Reaction Analysis ◽  
Reactive Magnetron ◽  
Substrate Bias Voltage

Results on hydrogenated carbon nitride (CNxHy) thin films grown by reactive magnetron sputtering in a mixed Ar/NH3 discharge are reported. Depending on the growth temperature (Ts) and negative substrate bias voltage (Vs), both the composition and the microstructure were altered. Using nuclear reaction analysis and resonant backscattering spectroscopy, the maximum N and H content were both 15 at. %. Both the hydrogen and nitrogen content of the films was found to decrease with increasing growth temperature. The results also show pronounced chemical resputtering effects, resulting in no net film growth for Vs > 75–100 V. X-ray photoelectron spectroscopy showed no signs of N bound to sp3 hybridized C. Also, the microstructure of the films was found to change with Ts. For Ts < 150 °C, a structure with crystalline clusters embedded in an “fullerene-like” matrix was observed by high-resolution transmission electron microscopy. Power-spectra obtained from the clusters could be identified with the cubic diamond structure. For Ts ≥ 300 °C, no crystalline clusters were found and the films had a homogeneous “fullerene-like” microstructure with strongly bent planes and closed shell-like features resembling bucky-onions. Evaluation of nanoindentation results from the homogeneous “fullerene-like” films gave hardness values between 7 and 11 GPa and elastic recoveries of 55–60%. This should be compared with hardness and elastic recoveries of 40–60 GPa and 85–90%, respectively, previously reported for on nonhydrogenated carbon nitride CNx films grown under the same conditions, but in pure N2 discharges.

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