Summary Abstract: The role of low‐energy ion bombardment during the growth of epitaxial TiN(100) films by reactive magnetron sputtering: Defect formation and annihilation

L. Hultman; U. Helmersson; S. A. Barnett; J.‐E. Sundgren; J. E. Greene

doi:10.1116/1.574946

Summary Abstract: The role of low‐energy ion bombardment during the growth of epitaxial TiN(100) films by reactive magnetron sputtering: Defect formation and annihilation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574946 ◽

1987 ◽

Vol 5 (4) ◽

pp. 2162-2164 ◽

Cited By ~ 4

Author(s):

L. Hultman ◽

U. Helmersson ◽

S. A. Barnett ◽

J.‐E. Sundgren ◽

J. E. Greene

Keyword(s):

Magnetron Sputtering ◽

Defect Formation ◽

Ion Bombardment ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

Journal of Materials Research ◽

10.1557/jmr.2011.428 ◽

2012 ◽

Vol 27 (5) ◽

pp. 765-779 ◽

Cited By ~ 84

Author(s):

Klaus Ellmer ◽

Thomas Welzel

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Energetic Particle ◽

Transparent Conductive Oxide ◽

Ion Bombardment ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Conductive Oxide ◽

Image Position

Abstract

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Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

Journal of Applied Physics ◽

10.1063/1.1510558 ◽

2002 ◽

Vol 92 (9) ◽

pp. 5084-5093 ◽

Cited By ~ 67

Author(s):

C.-S. Shin ◽

D. Gall ◽

Y.-W. Kim ◽

N. Hellgren ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Surface Interactions ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties

Journal of Applied Physics ◽

10.1063/1.1538316 ◽

2003 ◽

Vol 93 (5) ◽

pp. 3002-3015 ◽

Cited By ~ 76

Author(s):

J. Neidhardt ◽

Zs. Czigány ◽

I. F. Brunell ◽

L. Hultman

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Carbon Nitride ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Thin Solid Films ◽

Solid Films

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Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(88)90048-6 ◽

1988 ◽

Vol 92 (3-4) ◽

pp. 639-656 ◽

Cited By ~ 104

Author(s):

L. Hultman ◽

S.A. Barnett ◽

J.-E. Sundgren ◽

J.E. Greene

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Films

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Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

Physica B Condensed Matter ◽

10.1016/j.physb.2011.01.077 ◽

2011 ◽

Vol 406 (13) ◽

pp. 2658-2662 ◽

Cited By ~ 8

Author(s):

Chaoquan Hu ◽

Liang Qiao ◽

Hongwei Tian ◽

Xianyi Lu ◽

Qing Jiang ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Low‐energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577428 ◽

1991 ◽

Vol 9 (3) ◽

pp. 434-438 ◽

Cited By ~ 148

Author(s):

L. Hultman ◽

W.‐D. Münz ◽

J. Musil ◽

S. Kadlec ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Ion Flux ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Film Microstructure

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Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/abd72a ◽

2020 ◽

Author(s):

Romain Tonneau ◽

Pavel Moskovkin ◽

Jérôme Müller ◽

Thomas Melzig ◽

Emile Haye ◽

...

Keyword(s):

Thin Films ◽

Monte Carlo ◽

Magnetron Sputtering ◽

Monte Carlo Simulations ◽

Energetic Particles ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Multi Scale

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Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.01.012 ◽

2009 ◽

Vol 517 (16) ◽

pp. 4576-4582 ◽

Cited By ~ 12

Author(s):

M. Dudek ◽

A. Amassian ◽

O. Zabeida ◽

J.E. Klemberg-Sapieha ◽

L. Martinu

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Ion Bombardment ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Oxide Films

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The role of copper incorporation on the microstructure, mechanical and tribological properties of TiBN-Cu films by reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2019.06.053 ◽

2019 ◽

Vol 801 ◽

pp. 112-122 ◽

Cited By ~ 3

Author(s):

Isaac Asempah ◽

Junhua Xu ◽

Lihua Yu ◽

Huang Luo ◽

JinLin Liu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Tribological Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Cu Films ◽

Mechanical And Tribological Properties ◽

Copper Incorporation

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The role of methane in the formation of fullerene-like nanostructure in amorphous carbon film deposited by reactive magnetron sputtering

Diamond and Related Materials ◽

10.1016/j.diamond.2020.108018 ◽

2020 ◽

Vol 109 ◽

pp. 108018

Author(s):

Lulu Pei ◽

Pengfei Ju ◽

Li Ji ◽

Hongxuan Li ◽

Xiaohong Liu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Film ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Amorphous Carbon Film

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