Correlation between the dielectric constant and porosity of nanoporous silica thin films deposited by the gas evaporation technique

2001 ◽  
Vol 79 (19) ◽  
pp. 3140-3142 ◽  
Author(s):  
J. J. Si ◽  
H. Ono ◽  
K. Uchida ◽  
S. Nozaki ◽  
H. Morisaki ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Nanoporous Silica ◽  
Silica Thin Films ◽  
Evaporation Technique ◽  
Gas Evaporation Technique

Observation of Redshifts of Photoluminescence from Thin Films Assembled by CuCl Nanoclusters

1997 ◽  
Vol 11 (06) ◽  
pp. 275-281
Author(s):  
Bingyou Miao ◽  
Jianmin Hong ◽  
Pingping Chen ◽  
Xiaoli Yuan ◽  
Min Han ◽  
...  
Keyword(s):  
Thin Films ◽  
Quantum Confinement ◽  
Phonon Coupling ◽  
Transmission Electron ◽  
Two Samples ◽  
Evaporation Technique ◽  
The Mean ◽  
Quartz Substrates ◽  
Cucl Nanocrystals ◽  
Gas Evaporation Technique

Two samples of thin films, assembled by CuCl nanoclusters, have been prepared by the gas evaporation technique. The CuCl nanoclusters were deposited on monocrystalline silicon and quartz substrates and then coated with a layer of NaCl to prevent oxidation of the CuCl nanoclusters. From transmission electron microscope and selected area diffraction, it is clear that the two samples consist of CuCl nanocrystals and Cu aggregates and the mean diameters are about 3 nm and 6 nm. From the absorption and photoluminescence (PL) spectra of the two samples carried out at ~300 K, we found that the peaks of exciton absorption do not show up and luminescence peaks shift to lower energies, possibly due to the strong coupling between exciton and phonon. At 77 K, the PL peaks of excitons broadened by exciton–phonon coupling have been observed, in approximate agreement with the values calculated by the quantum confinement model. The broad peaks of emission from trapped states or bands have also been observed at 77 K. In addition, the interaction between exciton and phonon is stronger in the sample with mean diameter about 3 nm according to a larger broadening and redshift of the PL peak from excitons, in qualitative agreement with theoretical prediction.

Neutron Reflectivity Study of Lipid Membranes Assembled on Ordered Nanocomposite and Nanoporous Silica Thin Films

Langmuir ◽  
2005 ◽  
Vol 21 (7) ◽  
pp. 2865-2870 ◽  
Author(s):  
Dhaval A. Doshi ◽  
Andrew M. Dattelbaum ◽  
Erik B. Watkins ◽  
C. Jeffrey Brinker ◽  
Basil I. Swanson ◽  
...  
Keyword(s):  
Thin Films ◽  
Lipid Membranes ◽  
Nanoporous Silica ◽  
Neutron Reflectivity ◽  
Silica Thin Films

scholarly journals Near infrared photoluminescence from bismuth-doped nanoporous silica thin films

2013 ◽  
Vol 114 (3) ◽  
pp. 033524 ◽  
Author(s):  
Sa chu rong gui ◽  
Kenji Imakita ◽  
Minoru Fujii ◽  
Zhenhua Bai ◽  
Shinji Hayashi
Keyword(s):  
Thin Films ◽  
Near Infrared ◽  
Nanoporous Silica ◽  
Silica Thin Films

Nanoporous Silica for Low k Dielectrics

1996 ◽  
Vol 443 ◽  
Author(s):  
Teresa Ramos ◽  
Kevin Roderick ◽  
Alok Maskara ◽  
Douglas M. Smith
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Film Thickness ◽  
Pore Size ◽  
Ambient Pressure ◽  
Porous Solids ◽  
Nanoporous Silica ◽  
Low Density ◽  
Trade Offs ◽  
Small Pore

AbstractConsiderable progress has been made in development of thin films of nanoporous silica (also known as aerogels or low density xerogels) for ILD and IMD applications. Advantages of these materials include high thermal stability, small pore size, and similarity to conventional deposition processes, precursors and final material (silica). We have previously reported success in synthesizing low density, low dielectric constant (K<2) thin films using ambient pressure processing. However, processing of those films was complicated due to large number of process steps and difficulties in independently controlling both film thickness and film porosity.Nanoglass has now developed a new process which considerably reduces the number of process steps and allows independent control of both film thickness and porosity. The dielectric constant of the films can be tailored between 1.3 and 2.5. These films have improved mechanical properties due to controlled pore size and narrow pore size distribution and also because of higher density. The trade-offs between density, mechanical strength and dielectric constant for these types of porous solids will be elucidated. The known properties of the film and the process flow for deposition and post-deposition curing and the role of the relative rates of reaction, gelation, aging, and drying will be presented.

Persistent superhydrophilicity of sol–gel derived nanoporous silica thin films

2008 ◽  
Vol 42 (2) ◽  
pp. 025302 ◽  
Author(s):  
S Ganjoo ◽  
R Azimirad ◽  
O Akhavan ◽  
A Z Moshfegh
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Nanoporous Silica ◽  
Silica Thin Films

Rhombohedral Structure of Highly Ordered and Oriented Self-Assembled Nanoporous Silica Thin Films

2006 ◽  
Vol 18 (3) ◽  
pp. 723-730 ◽  
Author(s):  
Brian W. Eggiman ◽  
Michael P. Tate ◽  
Hugh W. Hillhouse
Keyword(s):  
Thin Films ◽  
Nanoporous Silica ◽  
Rhombohedral Structure ◽  
Silica Thin Films ◽  
Self Assembled

Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering

2000 ◽  
Vol 87 (3) ◽  
pp. 1193-1200 ◽  
Author(s):  
Wen-li Wu ◽  
William E. Wallace ◽  
Eric K. Lin ◽  
Gary W. Lynn ◽  
Charles J. Glinka ◽  
...  
Keyword(s):  
Thin Films ◽  
High Resolution ◽  
Neutron Scattering ◽  
Small Angle ◽  
Small Angle Neutron Scattering ◽  
Nanoporous Silica ◽  
X Ray ◽  
Silica Thin Films
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