Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering

2000 ◽  
Vol 87 (3) ◽  
pp. 1193-1200 ◽  
Author(s):  
Wen-li Wu ◽  
William E. Wallace ◽  
Eric K. Lin ◽  
Gary W. Lynn ◽  
Charles J. Glinka ◽  
...  
2009 ◽  
Vol 42 (6) ◽  
pp. 1085-1091 ◽  
Author(s):  
B. Roy ◽  
B. Karmakar ◽  
J. Bahadur ◽  
S. Mazumder ◽  
D. Sen ◽  
...  

A series of zinc oxide (ZnO) nanoparticles, substituted with manganese di-oxide, have been synthesized through a modified ceramic route using urea as a fuel. X-ray diffraction and high-resolution transmission electron microscopy studies indicate that the sizes of the ZnO particles are of nanometer dimension. Particles remain as single phase when the doping concentration is below 15 mol%. Small-angle neutron scattering indicates fractal-like agglomerates of these nanoparticles in powder form. The size distributions of the particles have been estimated from scattering experiments as well as microscopy studies. The average particle size estimated from small-angle scattering experiments was found to be somewhat more than that obtained from X-ray diffraction or electron microscopy measurement.


2000 ◽  
Vol 612 ◽  
Author(s):  
Eric K. Lin ◽  
Wen-li Wu ◽  
Changming Jin ◽  
Jeffrey T. Wetzel

AbstractHigh-resolution X-ray reflectivity and small angle neutron scattering measurements are used as complementary techniques to characterize the structure and properties of porous thin films for use as low-k interlevel dielectric (ILD) materials. With the addition of elemental composition information, the average pore size, porosity, pore connectivity, matrix density, average film density, film thickness, coefficient of thermal expansion, and moisture uptake of porous thin films are determined. Examples from different classes of materials and two analysis methods for small angle neutron scattering data are presented and discussed.


2000 ◽  
Vol 612 ◽  
Author(s):  
Wen-li Wu ◽  
Eric K. Lin ◽  
Changming Jin ◽  
Jeffrey T. Wetzel

AbstractA methodology to characterize nanoporous thin films based on a novel combination of high-resolution specular x-ray reflectivity and small-angle neutron scattering has been advanced to accommodate heterogeneities within the material surrounding nanoscale voids. More specifically, the average pore size, pore connectivity, film thickness, wall or matrix density, coefficient of thermal expansion, and moisture uptake of nanoporous thin films with non-homogeneous solid matrices can be measured. The measurements can be performed directly on films up to 1.5 µm thick while supported on silicon substrates. This method has been successfully applied to a wide range of industrially developed materials for use as low-k interlayer dielectrics.


Sign in / Sign up

Export Citation Format

Share Document