Effect of thermal processing on strain relaxation and interdiffusion in Si/SiGe heterostructures studied using Raman spectroscopy

2001 ◽  
Vol 79 (14) ◽  
pp. 2148-2150 ◽  
Author(s):  
S. J. Koester ◽  
K. Rim ◽  
J. O. Chu ◽  
P. M. Mooney ◽  
J. A. Ott ◽  
...  
2000 ◽  
Vol 638 ◽  
Author(s):  
WK Choi ◽  
V Ng ◽  
YW Ho ◽  
TB Chen ◽  
V Ho

AbstractThe high resolution transmission electron microscopy and Raman spectroscopy results of germanium nanocrystals embedded in SiO2 synthesized by rapid thermal processing (RTA) have been presented. From the results of samples with different Ge concentrations, it was concluded that there is a narrow window in the Ge concentration that can produce nanocrystals. We also showed that it is possible to vary RTA duration or temperature to produce Ge nanocrystals with varying sizes. Our results therefore suggest that it is possible to utilize (i) annealing duration and; (ii) temperature to tune crystal sizes for optoelectronic applications.


2002 ◽  
Vol 738 ◽  
Author(s):  
Koji Usuda ◽  
Tomohisa Mizuno ◽  
Tsutomu Tezuka ◽  
Naoharu Sugiyama ◽  
Yoshihiko Moriyama ◽  
...  

ABSTRACTStrained-Si-On-Insulator (Strained-SOI) MOSFETs are one of the most promising device structures for high speed and/or low power CMOS. In realizing strained-Si MOS LSI, fabrication of strained-Si MOSFETs with small sizes are indispensable and thus, the investigation of the strain relaxation is an important issue. Therefore, the strain relaxation of strained-SOI mesa islands with small active area was investigated in this study. Thin strained-Si films were grown on thin relaxed SiGe-on-insulator (SGOI) structures (x=0.28). The isolation process was carried out by using chemical-dry-etching (CDE) to fabricate samples with small active areas. Using Raman spectroscopy with resolution of > 1 micron meter, strained-Si islands on SGOI substrates with the size of 5 micron meter square were investigated. Rapid-thermal-annealing (RTA) in N2 atmosphere was performed to study the strain relaxation during heating processes. As a result, it was confirmed that the strained-Si layers grown on relaxed SiGe (x=0.28) before and after mesa isolation, down to 5 micron meter in size, had almost no relaxation after the RTA process at 1000°C. Furthermore, it was confirmed that the nano-beam electron diffraction (NBD) measurement showed similar tendency regarding the strain relaxation.


1995 ◽  
Vol 77 (3) ◽  
pp. 1126-1132 ◽  
Author(s):  
P. Puech ◽  
G. Landa ◽  
R. Carles ◽  
P. S. Pizani ◽  
E. Daran ◽  
...  

Crystals ◽  
2020 ◽  
Vol 10 (4) ◽  
pp. 311 ◽  
Author(s):  
Shuo-Wei Chen ◽  
Chia-Jui Chang ◽  
Tien-Chang Lu

Strains and V-shaped pits are essential factors for determining the efficiency of GaN-based light-emitting diodes (LEDs). In this study, we systematically analyzed GaN LED structures on patterned sapphire substrates (PSSs) with two types of growth temperature employed for prestrained layers and three different thickness of n-type GaN layers by using cathodoluminescence (CL), microphotoluminescence (PL), and depth-resolved confocal Raman spectroscopy. The results indicated that V-pits formation situation can be analyzed using CL. From the emission peak intensity ratio of prestrained layers and multiple quantum wells (MQWs) in the CL spectrum, information regarding strain relaxation between prestrained layers and MQWs was determined. Furthermore, micro-PL and depth-resolved confocal Raman spectroscopy were employed to validate the results obtained from CL measurements. The growth conditions of prestrained layers played a dominant role in the determination of LED performance. The benefit of the thick layer of n-GaN was the strain reduction, which was counteracted by an increase in light absorption in thick n-type doped layers. Consequently, the most satisfactory LED performance was observed in a structure with relatively lower growth temperature of prestrained layers that exhibited larger V-pits, leading to higher strain relaxation and thinner n-type GaN layers, which prevent light absorption caused by n-type GaN layers.


2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Elamin E. Ibrahim ◽  
Dorina Magdalena Chipara ◽  
Ram Thapa ◽  
Karen Lozano ◽  
Mircea Chipara

Raman spectroscopy investigations on nanocomposites obtained by dispersing halloysite within isotactic polypropylene are reported. A detailed analysis of the modifications of the regularity band associated to the polymeric matrix is presented. The Raman lines assigned to the polymeric matrix are broadened and weakened as the loading with halloysite is increased. The analysis of Raman lines indicates that the polymeric matrix becomes less crystalline upon the loading with halloysite and that the nanofiller is experiencing a weak dehydration upon dispersion within the polymeric matrix, probably due to the related thermal processing used to achieve the dispersion of halloysite.


2016 ◽  
Vol 70 (9) ◽  
pp. 1555-1560 ◽  
Author(s):  
Guanggen Zeng ◽  
Paul Harrison ◽  
Ali Kidman ◽  
Alaa Al-mebir ◽  
Lianghuan Feng ◽  
...  

Raman spectra specific to CdS and CdTe were obtained on the CdS/CdTe heterojunction interface by employing two excitation wavelengths of λ1 = 488 nm and λ2 = 633 nm, respectively, from the glass side of Glass/FTO/CdS/CdTe/HgTe:Cu:graphite/Ag solar cells fabricated using pulsed-laser deposition (PLD). This two-wavelength Raman spectroscopy approach, with one wavelength selected below the absorption edge of the window layer (λ2 in this case), allows nondestructive characterization of the CdS/CdTe heterojunction and therefore correlation of the interfacial properties with the solar cell performance. In this study, the evolution of the interfacial strain relaxation during cell fabrication process was found to be affected not only by the inter-diffusion of S and Te corresponding to the formation of CdS xTe 1–x ternary alloy with a various x from ∼0.01 to ∼0.067, but also by the variation in misfit dislocations (MDs) at CdS/CdTe interface from Raman TO/LO ratio ∼2.85 for as-deposited sample to TO/LO ∼4.44 for the cells post treatment. This is consistent with the change of the Urbach energy from 0.03 eV to 0.09 eV, indicative of the deterioration of crystalline quality of CdTe at interface although improved CdTe crystalline quality was observed away from the interface after the CdCl2 annealing. This difference crucially impacted on the rectification characteristics of the CdS/CdTe heterojunction and therefore the solar cell performance.


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