scholarly journals Effect of Strains and V-Shaped Pit Structures on the Performance of GaN-Based Light-Emitting Diodes

Crystals ◽  
2020 ◽  
Vol 10 (4) ◽  
pp. 311 ◽  
Author(s):  
Shuo-Wei Chen ◽  
Chia-Jui Chang ◽  
Tien-Chang Lu
Keyword(s):  
Raman Spectroscopy ◽  
Growth Temperature ◽  
Light Absorption ◽  
Light Emitting Diodes ◽  
Strain Relaxation ◽  
Thick Layer ◽  
Multiple Quantum ◽  
Confocal Raman Spectroscopy ◽  
Light Emitting ◽  
Confocal Raman

Strains and V-shaped pits are essential factors for determining the efficiency of GaN-based light-emitting diodes (LEDs). In this study, we systematically analyzed GaN LED structures on patterned sapphire substrates (PSSs) with two types of growth temperature employed for prestrained layers and three different thickness of n-type GaN layers by using cathodoluminescence (CL), microphotoluminescence (PL), and depth-resolved confocal Raman spectroscopy. The results indicated that V-pits formation situation can be analyzed using CL. From the emission peak intensity ratio of prestrained layers and multiple quantum wells (MQWs) in the CL spectrum, information regarding strain relaxation between prestrained layers and MQWs was determined. Furthermore, micro-PL and depth-resolved confocal Raman spectroscopy were employed to validate the results obtained from CL measurements. The growth conditions of prestrained layers played a dominant role in the determination of LED performance. The benefit of the thick layer of n-GaN was the strain reduction, which was counteracted by an increase in light absorption in thick n-type doped layers. Consequently, the most satisfactory LED performance was observed in a structure with relatively lower growth temperature of prestrained layers that exhibited larger V-pits, leading to higher strain relaxation and thinner n-type GaN layers, which prevent light absorption caused by n-type GaN layers.

scholarly journals Improved Performance of GaN-Based Light-Emitting Diodes Grown on Si (111) Substrates with NH3 Growth Interruption

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 399
Author(s):  
Sang-Jo Kim ◽  
Semi Oh ◽  
Kwang-Jae Lee ◽  
Sohyeon Kim ◽  
Kyoung-Kook Kim
Keyword(s):  
Buffer Layer ◽  
Light Emitting Diodes ◽  
Defect Density ◽  
Strain Relaxation ◽  
Multiple Quantum Well ◽  
Light Output ◽  
Multiple Quantum ◽  
Light Emitting ◽  
Growth Interruption ◽  
Aln Buffer

We demonstrate the highly efficient, GaN-based, multiple-quantum-well light-emitting diodes (LEDs) grown on Si (111) substrates embedded with the AlN buffer layer using NH3 growth interruption. Analysis of the materials by the X-ray diffraction omega scan and transmission electron microscopy revealed a remarkable improvement in the crystalline quality of the GaN layer with the AlN buffer layer using NH3 growth interruption. This improvement originated from the decreased dislocation densities and coalescence-related defects of the GaN layer that arose from the increased Al migration time. The photoluminescence peak positions and Raman spectra indicate that the internal tensile strain of the GaN layer is effectively relaxed without generating cracks. The LEDs embedded with an AlN buffer layer using NH3 growth interruption at 300 mA exhibited 40.9% higher light output power than that of the reference LED embedded with the AlN buffer layer without NH3 growth interruption. These high performances are attributed to an increased radiative recombination rate owing to the low defect density and strain relaxation in the GaN epilayer.

Micro-Raman Spectroscopy: Self-Heating Effects In Deep UV Light Emitting Diodes

2002 ◽  
Vol 743 ◽  
Author(s):  
A. Sarua ◽  
M. Kuball ◽  
M. J. Uren ◽  
A. Chitnis ◽  
J. P. Zhang ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Heat Dissipation ◽  
Light Emitting Diodes ◽  
Light Output ◽  
Multiple Quantum ◽  
Light Emitting ◽  
Self Heating ◽  
Micro Raman Spectroscopy ◽  
Heating Effects ◽  
Heat Sinking

ABSTRACTUltraviolet light emitting diodes (LED) based on GaN and its ternary alloy AlGaN are key devices for applications such as solid state white lighting and chemical sensing. Ultraviolet LEDs are prone to self-heating effects, i.e., temperature rises during operation, contributing significantly to the commonly observed saturation of light output power at relatively low input currents. Rather little, however, is known about the actual device temperature of an operating ultraviolet LED. Using micro-Raman spectroscopy temperature measurements were performed as a function of input current on 325nm-Al0.18Ga0.82N/Al0.12Ga0.88N multiple quantum wells LEDs grown on sapphire substrates, flip-chip mounted on SiC for heat-sinking. Temperature maps were recorded over the active device area. Temperature rises of about 65 °C were measured at input currents as low as 50mA (at 8V) for 200 μm x 200 μm size LEDs despite flipchip mounting the devices. Temperature rises at the device edges were found to be higher than in the device center, due to combined heat sinking and current crowding effects. Finite difference heat dissipation simulations were performed and compared to the experimental results.

A Comparative Study of Thermal Metrology Techniques for Ultraviolet Light Emitting Diodes

2013 ◽  
Vol 135 (9) ◽  
Author(s):  
Shweta Natarajan ◽  
Yishak Habtemichael ◽  
Samuel Graham
Keyword(s):  
Raman Spectroscopy ◽  
Comparative Study ◽  
Quantum Wells ◽  
Ultraviolet Light ◽  
Light Emitting Diodes ◽  
Multiple Quantum ◽  
Forward Voltage ◽  
Light Emitting ◽  
Uv Leds ◽  
Ultraviolet Light Emitting Diodes

Methods used to measure the temperature of AlxGa1−xN based ultraviolet light emitting diodes (UV LEDs) are based on optical or electrical phenomena that are sensitive to either local, surface, or average temperatures within the LED. A comparative study of the temperature rise of AlxGa1−xN UV LEDs measured by micro-Raman spectroscopy, infrared (IR) thermography, and the forward voltage method is presented. Experimental temperature measurements are provided for UV LEDs with micropixel and interdigitated contact geometries, as well as for a number of different packaging configurations. It was found that IR spectroscopy was sensitive to optical properties of the device layers, while forward voltage method provided higher temperatures, in general. Raman spectroscopy was used to measure specific layers within the LED, showing that growth substrate temperatures in the flip-chip LEDs agreed more closely to IR measurements while layers closer to the multiple quantum wells (MQWs) agreed more closely with Forward Voltage measurements.

Low-Temperature Operation of Green, Blue and UV InGaN/GaN Multiple-Quantum-Well Light-Emitting Diodes

2003 ◽  
Vol 764 ◽  
Author(s):  
X. A. Cao ◽  
S. F. LeBoeuf ◽  
J. L. Garrett ◽  
A. Ebong ◽  
L. B. Rowland ◽  
...  
Keyword(s):  
Quantum Well ◽  
Light Emitting Diodes ◽  
Multiple Quantum Well ◽  
Light Output ◽  
Localized States ◽  
Multiple Quantum ◽  
Nonradiative Recombination ◽  
Light Emitting ◽  
Temperature Range ◽  
Green Leds

Absract:Temperature-dependent electroluminescence (EL) of InGaN/GaN multiple-quantum-well light-emitting diodes (LEDs) with peak emission energies ranging from 2.3 eV (green) to 3.3 eV (UV) has been studied over a wide temperature range (5-300 K). As the temperature is decreased from 300 K to 150 K, the EL intensity increases in all devices due to reduced nonradiative recombination and improved carrier confinement. However, LED operation at lower temperatures (150-5 K) is a strong function of In ratio in the active layer. For the green LEDs, emission intensity increases monotonically in the whole temperature range, while for the blue and UV LEDs, a remarkable decrease of the light output was observed, accompanied by a large redshift of the peak energy. The discrepancy can be attributed to various amounts of localization states caused by In composition fluctuation in the QW active regions. Based on a rate equation analysis, we find that the densities of the localized states in the green LEDs are more than two orders of magnitude higher than that in the UV LED. The large number of localized states in the green LEDs are crucial to maintain high-efficiency carrier capture at low temperatures.

High-Bright InGaN Multiple-Quantum-Well Blue Light-Emitting Diodes on Si (111) Using AlN/GaN Multilayers with a Thin AlN/AlGaN Buffer Layer

2003 ◽  
Vol 42 (Part 2, No. 3A) ◽  
pp. L226-L228 ◽  
Author(s):  
Baijun Zhang ◽  
Takashi Egawa ◽  
Hiroyasu Ishikawa ◽  
Yang Liu ◽  
Takashi Jimbo
Keyword(s):  
Quantum Well ◽  
Buffer Layer ◽  
Blue Light ◽  
Light Emitting Diodes ◽  
Multiple Quantum Well ◽  
Multiple Quantum ◽  
Light Emitting ◽  
Algan Buffer
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