Lateral current spreading in GaN-based light-emitting diodes utilizing tunnel contact junctions

2001 ◽  
Vol 78 (21) ◽  
pp. 3265-3267 ◽  
Author(s):  
Seong-Ran Jeon ◽  
Young-Ho Song ◽  
Ho-Jin Jang ◽  
Gye Mo Yang ◽  
Soon Won Hwang ◽  
...  
2008 ◽  
Vol 92 (26) ◽  
pp. 261105 ◽  
Author(s):  
Ray-Ming Lin ◽  
Yuan-Chieh Lu ◽  
Yi-Lun Chou ◽  
Guo-Hsing Chen ◽  
Yung-Hsiang Lin ◽  
...  

2020 ◽  
Vol 7 (23) ◽  
pp. 2001760
Author(s):  
Qianqian Wu ◽  
Fan Cao ◽  
Haoran Wang ◽  
Jianquan Kou ◽  
Zi‐Hui Zhang ◽  
...  

2003 ◽  
Vol 799 ◽  
Author(s):  
O. Kwon ◽  
J. Boeckl ◽  
M. L. Lee ◽  
A. J. Pitera ◽  
E. A. Fitzgerald ◽  
...  

ABSTRACTAlGaInP visible resonant cavity light emitting diodes (RCLEDs) were grown and fabricated on low-dislocation density, SiGe/Si metamorphic substrates by molecular beam epitaxy. A comparison with devices grown on GaAs and Ge substrates showed that not only did the RCLED device structure successfully transfer to the SiGe substrate, but also a higher optical output power was obtained. This is a result of a high thermal conductivity and an enhanced lateral current spreading. In addition, the growth of an AlGaAs current spreading layer and a modified top metal contact were incorporated to the SiGe RCLED to improve the device performance. With these improvements, a 410μm × 410μm device was fabricated with an optical power of 166μW at 665nm peak wavelength under 500mA current injection and an extremely narrow full width half maximum (FWHM) value of 3.63nm for electroluminescent emission under 50mA injection current.


2013 ◽  
Vol 9 (4) ◽  
pp. 266-271 ◽  
Author(s):  
Shanjin Huang ◽  
Bingfeng Fan ◽  
Zimin Chen ◽  
Zhiyuan Zheng ◽  
Hongtai Luo ◽  
...  

2003 ◽  
Vol 47 (10) ◽  
pp. 1817-1823 ◽  
Author(s):  
A. Ebong ◽  
S. Arthur ◽  
E. Downey ◽  
X.A. Cao ◽  
S. LeBoeuf ◽  
...  

Nanomaterials ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 1178 ◽  
Author(s):  
Qiang Zhao ◽  
Jiahao Miao ◽  
Shengjun Zhou ◽  
Chengqun Gui ◽  
Bin Tang ◽  
...  

We demonstrate high-power GaN-based vertical light-emitting diodes (LEDs) (VLEDs) on a 4-inch silicon substrate and flip-chip LEDs on a sapphire substrate. The GaN-based VLEDs were transferred onto the silicon substrate by using the Au–In eutectic bonding technique in combination with the laser lift-off (LLO) process. The silicon substrate with high thermal conductivity can provide a satisfactory path for heat dissipation of VLEDs. The nitrogen polar n-GaN surface was textured by KOH solution, which not only improved light extract efficiency (LEE) but also broke down Fabry–Pérot interference in VLEDs. As a result, a near Lambertian emission pattern was obtained in a VLED. To improve current spreading, the ring-shaped n-electrode was uniformly distributed over the entire VLED. Our combined numerical and experimental results revealed that the VLED exhibited superior heat dissipation and current spreading performance over a flip-chip LED (FCLED). As a result, under 350 mA injection current, the forward voltage of the VLED was 0.36 V lower than that of the FCLED, while the light output power (LOP) of the VLED was 3.7% higher than that of the FCLED. The LOP of the FCLED saturated at 1280 mA, but the light output saturation did not appear in the VLED.


2001 ◽  
Vol 188 (1) ◽  
pp. 167-170 ◽  
Author(s):  
S.-R. Jeon ◽  
Y.H. Song ◽  
H.J. Jang ◽  
K.S. Kim ◽  
G.M. Yang ◽  
...  

2014 ◽  
Vol 11 (3-4) ◽  
pp. 817-820
Author(s):  
Thorsten Passow ◽  
Michael Kunzer ◽  
Paul Börner ◽  
Wilfried Pletschen ◽  
Klaus Köhler ◽  
...  

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