The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth

1999 ◽  
Vol 75 (26) ◽  
pp. 4162-4164 ◽  
Author(s):  
N. J. C. Ingle ◽  
R. H. Hammond ◽  
M. R. Beasley ◽  
D. H. A. Blank
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Atomic Oxygen ◽  
Film Growth ◽  
Thin Film Growth ◽  
High Flux

scholarly journals Idiosyncrasies of Physical Vapor Deposition Processes from Various Knudsen Cells for Quinacridone Thin Film Growth on Silicon Dioxide

2015 ◽  
Vol 119 (36) ◽  
pp. 20900-20910 ◽  
Author(s):  
Boris Scherwitzl ◽  
Christian Röthel ◽  
Andrew O. F. Jones ◽  
Birgit Kunert ◽  
Ingo Salzmann ◽  
...  
Keyword(s):  
Thin Film ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Film Growth ◽  
Thin Film Growth ◽  
Physical Vapor Deposition Processes ◽  
Deposition Processes

Nano-Scale Particle Formation by Dynamic Mixing Method in Physical Vapor Deposition

2016 ◽  
Vol 708 ◽  
pp. 14-19 ◽  
Author(s):  
Seok Keun Koh ◽  
Jung Hwan Lee ◽  
Charles Lee ◽  
Katherine Koh
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Film Growth ◽  
Uv Spectroscopy ◽  
Deposition Process ◽  
Thin Film Growth ◽  
Physical Parameters ◽  
Mixing Method ◽  
Scale Particle

Nano size (2 - 10 nm) metal particles were formed and accumulated on powder substrate by conventional physical vapor deposition (PVD) process, in which the powder were a non-volatile in vacuum, such as Al2O3 powder. The neutral nuclei which were formed on the substrates from vaporized or sputtered metal atoms at an initial thin film growth were not grown up to coalescence and island stage with arrival atoms and ad-atom migration in the continuous deposition process, when the powder in vessel were continuously stirred during the deposition. Nano sized particles on the polymer chips (diameter: 1-2mm) easily dispersed into the polymer matrix by heating the chips, and on non-soluble powder, g-Al2O3, were stuck on the supporters stably in air. The nanoparticles on sucrose directly formed colloid with water solvents without dispersive agents. Most of the nano sized particles appear their own characteristic colors due to plasmon effect. Concentration and size of the nanoparticles are controlled by physical parameters in the PVD and the stirring speed of the powder. Surface phenomena on the substrate have been discussed with TEM, SEM, EDX, UV spectroscopy, etc. comparing with the conventional thin film growth.

Metal Nano Particles Formation on Rotating Powder (NPP) Substrate in Physical Vapor Deposition

2015 ◽  
Vol 1119 ◽  
pp. 3-8
Author(s):  
Seok Keun Koh ◽  
Charles Lee ◽  
Jung Hwan Lee ◽  
Byung Kwuan Kang ◽  
Hiroyuki Kaji ◽  
...  
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Film Growth ◽  
Uv Spectroscopy ◽  
Thin Film Growth ◽  
Nano Particles ◽  
Physical Parameters ◽  
Metal Evaporation ◽  
Metal Nano Particles

Nano-sized (2~10 nm) metal particles were formed and accumulated on a rotating powders substrate by conventional physical vapor deposition (PVD) process. Sucrose was selected as a supporter for the nano-particles on powder (NPP) process. Nuclei, which were formed on the substrate from vaporized or sputtered metal atoms at an initial thin film growth, did not grow up to coalescence stage and did not agglomerate each other when the powder in the vessel was continuously circulated during the deposition. Size of the nanoparticles is controlled by the physical parameters such as metal evaporation rate, rotation speed of the powder, selection of the powder in the PVD. Formation mechanism of nano-particles on the carrier powder have been explained in terms of thermodynamics with TEM, SEM, EDX, UV spectroscopy, etc. comparing with conventional thin film growth in PVD.

Concentration of atomic oxygen in low earth orbit and in the laboratory for use in high quality oxide thin film growth

1998 ◽  
Author(s):  
J. A. Schultz ◽  
K. Eipers-Smith ◽  
K. Waters ◽  
S. Schultz ◽  
M. Sterling ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Oxygen ◽  
Film Growth ◽  
Low Earth Orbit ◽  
Thin Film Growth ◽  
Oxide Thin Film ◽  
Earth Orbit ◽  
High Quality

Effect of hydrogen atmosphere in Cu thin film growth by chemical vapor deposition using Cu(dmamb)2

2012 ◽  
Vol 89 ◽  
pp. 109-115 ◽  
Author(s):  
Jong Mun Choi ◽  
Dohan Lee ◽  
Ji Hun Park ◽  
Chang Gyoun Kim ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Hydrogen Atmosphere ◽  
Thin Film Growth ◽  
Cu Thin Film
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