Atomic-order layer-by-layer role-share etching of silicon nitride using an electron cyclotron resonance plasma

Takashi Matsuura; Yasuhiko Honda; Junichi Murota

doi:10.1063/1.124165

Atomic-order layer-by-layer role-share etching of silicon nitride using an electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.124165 ◽

1999 ◽

Vol 74 (23) ◽

pp. 3573-3575 ◽

Cited By ~ 24

Author(s):

Takashi Matsuura ◽

Yasuhiko Honda ◽

Junichi Murota

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Layer By Layer ◽

Atomic Order ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

10.1117/12.324050 ◽

1998 ◽

Author(s):

Roberto R. Panepucci ◽

Jose A. Diniz ◽

Eduardo Carli ◽

Peter J. Tatschi ◽

Jacobus W. Swart

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Si epitaxial growth on atomic-order nitrided Si(100) using electron cyclotron resonance plasma

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2004.09.034 ◽

2005 ◽

Vol 8 (1-3) ◽

pp. 65-68 ◽

Cited By ~ 2

Author(s):

Masaki Mori ◽

Takuya Seino ◽

Daisuke Muto ◽

Masao Sakuraba ◽

Junichi Murota

Keyword(s):

Epitaxial Growth ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Atomic Order ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma

IEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma ◽

10.1109/plasma.1992.697984 ◽

2005 ◽

Author(s):

Sun-Kyu Song ◽

Hong-young Chang

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Formation ◽

Electron Cyclotron ◽

Nitride Film ◽

Silicon Nitride Film ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition and etching of silicon nitride on GaSb for optoelectronic applications

Materials Science and Engineering B ◽

10.1016/0921-5107(94)90085-x ◽

1994 ◽

Vol 28 (1-3) ◽

pp. 369-373

Author(s):

R. Bonnot ◽

A. Gouskov ◽

G. Bougnot

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Optoelectronic Applications ◽

Resonance Plasma

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ChemInform Abstract: The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

ChemInform ◽

10.1002/chin.199002353 ◽

1990 ◽

Vol 21 (2) ◽

Author(s):

NGUYEN SON VAN NGUYEN SON VAN ◽

K. ALBAUGH

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma

International Conference on Plasma Sciences (ICOPS) ◽

10.1109/plasma.1993.593093 ◽

1993 ◽

Author(s):

Y.-J. Kim ◽

J.-H. Kim ◽

S.-K. Song ◽

H.-Y. Chang

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Formation ◽

Electron Cyclotron ◽

Nitride Film ◽

Silicon Nitride Film ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1371323 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1336-1340 ◽

Cited By ~ 12

Author(s):

K. Deenamma Vargheese ◽

G. Mohan Rao

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Nitride Films ◽

Resonance Plasma

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Electron cyclotron resonance plasma chemical vapor deposited silicon nitride for micromechanical applications

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581028 ◽

1998 ◽

Vol 16 (2) ◽

pp. 881-884 ◽

Cited By ~ 8

Author(s):

S. Leclerc ◽

A. Lecours ◽

M. Caron ◽

E. Richard ◽

G. Turcotte ◽

...

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Chemical Vapor Deposited ◽

Resonance Plasma

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Silicon nitride formation from a silane–nitrogen electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577392 ◽

1991 ◽

Vol 9 (3) ◽

pp. 480-484 ◽

Cited By ~ 54

Author(s):

J. C. Barbour ◽

H. J. Stein ◽

O. A. Popov ◽

M. Yoder ◽

C. A. Outten

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Nitride Formation ◽

Resonance Plasma

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