A reflection high-energy electron diffraction and atomic force microscopy study of the chemical beam epitaxial growth of InAs and InP islands on (001) GaP

1998 ◽  
Vol 72 (8) ◽  
pp. 954-956 ◽  
Author(s):  
B. Junno ◽  
T. Junno ◽  
M. S. Miller ◽  
L. Samuelson
2011 ◽  
Vol 1295 ◽  
Author(s):  
Costel Constantin ◽  
Abhijit Chinchore ◽  
Arthur R. Smith

ABSTRACTThe combination of the molecular beam epitaxy growth method with the in-situ reflection high energy electron diffraction measurements currently offers unprecedented control of crystalline growth materials. We present here a stoichiometric study of MnxSc(1-x) [x = 0, 0.03, 0.05, 0.15, 0.25, 0.35, and 0.50] thin films grown on MgO(001) substrates with this growth method. Reflection high energy electron diffraction and atomic force microscopy measurements reveal alloy behavior for all of our samples. In addition, we found that samples Mn0.10Sc0.90 and Mn0.50Sc0.50 display surface self-assembled nanowires with a length/width ratio of ~ 800 – 2000.


1997 ◽  
Vol 70 (8) ◽  
pp. 990-992 ◽  
Author(s):  
Q. Z. Liu ◽  
L. Shen ◽  
K. V. Smith ◽  
C. W. Tu ◽  
E. T. Yu ◽  
...  

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